Zhang Wen, Wong Ping Kwan Johnny, Zhou Xiaochao, Rath Ashutosh, Huang Zhaocong, Wang Hongyu, Morton Simon A, Yuan Jiaren, Zhang Lei, Chua Rebekah, Zeng Shengwei, Liu Er, Xu Feng, Chua Daniel H C, Feng Yuan Ping, van der Laan Gerrit, Pennycook Stephen J, Zhai Ya, Wee Andrew T S
Department of Physics , National University of Singapore , 2 Science Drive 3 , Singapore 117542 , Singapore.
Centre for Advanced 2D Materials and Graphene Research Centre , National University of Singapore , 6 Science Drive 2 , Singapore 117546 , Singapore.
ACS Nano. 2019 Feb 26;13(2):2253-2261. doi: 10.1021/acsnano.8b08926. Epub 2019 Feb 18.
Ferromagnet/two-dimensional transition-metal dichalcogenide (FM/2D TMD) interfaces provide attractive opportunities to push magnetic information storage to the atomically thin limit. Existing work has focused on FMs contacted with mechanically exfoliated or chemically vapor-deposition-grown TMDs, where clean interfaces cannot be guaranteed. Here, we report a reliable way to achieve contamination-free interfaces between ferromagnetic CoFeB and molecular-beam epitaxial MoSe. We show a spin reorientation arising from the interface, leading to a perpendicular magnetic anisotropy (PMA), and reveal the CoFeB/2D MoSe interface allowing for the PMA development in a broader CoFeB thickness-range than common systems such as CoFeB/MgO. Using X-ray magnetic circular dichroism analysis, we attribute generation of this PMA to interfacial d-d hybridization and deduce a general rule to enhance its magnitude. We also demonstrate favorable magnetic softness and considerable magnetic moment preserved at the interface and theoretically predict the interfacial band matching for spin filtering. Our work highlights the CoFeB/2D MoSe interface as a promising platform for examination of TMD-based spintronic applications and might stimulate further development with other combinations of FM/2D TMD interfaces.
铁磁体/二维过渡金属硫族化合物(FM/2D TMD)界面为将磁信息存储推向原子级厚度极限提供了诱人的机会。现有工作主要集中在与机械剥离或化学气相沉积生长的TMD接触的铁磁体上,在这种情况下无法保证界面清洁。在此,我们报告了一种在铁磁CoFeB与分子束外延生长的MoSe之间实现无污染物界面的可靠方法。我们展示了由界面引起的自旋重取向,从而导致垂直磁各向异性(PMA),并揭示了CoFeB/二维MoSe界面在比CoFeB/MgO等常见体系更宽的CoFeB厚度范围内允许PMA的发展。通过X射线磁圆二色性分析,我们将这种PMA的产生归因于界面d-d杂化,并推导出增强其强度的一般规则。我们还展示了界面处良好的磁软度和相当大的磁矩,并从理论上预测了用于自旋过滤的界面能带匹配。我们的工作突出了CoFeB/二维MoSe界面作为基于TMD的自旋电子学应用研究的一个有前景的平台,并可能刺激FM/2D TMD界面其他组合的进一步发展。