State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter , Chinese Academy of Sciences , Fuzhou 350002 , P. R. China.
College of Electronics and Information Science , Fujian Jiangxia University , Fuzhou 350108 , P. R. China.
Inorg Chem. 2019 Mar 18;58(6):3990-3999. doi: 10.1021/acs.inorgchem.9b00094. Epub 2019 Mar 1.
Mid- and far-infrared nonlinear optical (MFIR NLO) materials are important in modern laser technologies. However, it is very challenging to develop materials that can achieve a subtle balance between the key requirements, such as large NLO response, high laser-induced damage threshold (LIDT), wide IR transparency, and phase-matching. In this work, a new wide IR transparency (0.38-15.3 μm) NLO crystal BaInZnS (SS26) is synthesized. Further, its composite system BaInZnS- nZnS is synthesized by eutectic reaction. In particular, BaInZnS-14ZnS (SS40) shows excellent balanced NLO performance that includes a large band gap of 3.05 eV, high LIDT (13.3 × AgGaS), large second harmonic generation (SHG) response (2.1 × AgGaS at 2050 nm, 5.2 × KDP at 1064 nm), and wide optical transmission window (0.37-15.4 μm). Importantly, the phase-matching condition is realized for SS40 by interfaces formed between the crystal face (112) of matrix SS26 and the crystal face (111) of reinforcement cubic ZnS by topological chemical reaction, and the NLO performance can be tuned by different concentrations of ZnS. First-principles simulations are employed to study NLO properties of SS26 and the interfaces. This work demonstrates that SS40 is a promising MFIR NLO material, and tuning components of the composite material system is a useful way to develop new MFIR NLO materials with excellent comprehensive performance.
中波和远红外非线性光学(MFIR NLO)材料在现代激光技术中具有重要作用。然而,开发出能够在关键要求之间取得微妙平衡的材料极具挑战性,这些要求包括大的 NLO 响应、高的激光诱导损伤阈值(LIDT)、宽的红外透明度和相位匹配。在这项工作中,合成了一种新的宽红外透明度(0.38-15.3μm)的 NLO 晶体 BaInZnS(SS26)。进一步地,通过共晶反应合成了 BaInZnS-nZnS 复合体系。特别地,BaInZnS-14ZnS(SS40)表现出卓越的平衡 NLO 性能,包括 3.05eV 的宽带隙、高 LIDT(13.3×AgGaS)、大的二次谐波生成(SHG)响应(2050nm 处 2.1×AgGaS,1064nm 处 5.2×KDP)和宽的光学透过窗口(0.37-15.4μm)。重要的是,通过拓扑化学反应在基质 SS26 的晶面(112)和增强立方 ZnS 的晶面(111)之间形成的界面实现了 SS40 的相位匹配条件,并且 NLO 性能可以通过不同浓度的 ZnS 进行调节。第一性原理模拟用于研究 SS26 和界面的 NLO 性质。这项工作表明 SS40 是一种有前途的 MFIR NLO 材料,并且调节复合材料体系的成分是开发具有优异综合性能的新型 MFIR NLO 材料的一种有效途径。