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异质界面驱动的能带排列工程及其对半导体多层纳米结构宏观性能的影响。

Heterointerface-Driven Band Alignment Engineering and its Impact on Macro-Performance in Semiconductor Multilayer Nanostructures.

作者信息

Cai Chenyuan, Zhao Yunhao, Xie Shengwen, Zhao Xuebing, Zhang Yu, Xu Yingqiang, Liang Chongyun, Niu Zhichuan, Shi Yi, Li Yuesheng, Che Renchao

机构信息

Laboratory of Advanced Materials, Department of Materials Science, Collaborative Innovation Center of Chemistry for Energy Materials, Fudan University, Shanghai, 200438, P. R. China.

State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, P. R. China.

出版信息

Small. 2019 Jul;15(27):e1900837. doi: 10.1002/smll.201900837. Epub 2019 Apr 24.

Abstract

Interfaces in semiconductor heterostructures is of continuously greater significance in the trend of scaling materials down to the atomic limit. Since atoms tend to behave more irregularly around interfaces than in internal materials, accurate energy band alignment becomes a major challenge, which determines the ultimate performance of devices. Therefore, a comprehensive understanding of the interplay between heterointerface, energy band, and macro-performance is desiderated. Here, such interplay is explored by investigating asymmetric heterointerfaces with identical fabrication parameters in multiple-quantum-well lasers. The unexpected asymmetry derives from the atomic discrepancy around heterointerfaces, which ultimately improves the optical property through altered valence band offsets. Strain and charge distribution around heterointerfaces are characterized via geometric phase analysis and in situ bias electron holography, respectively. Combining experiments with theories, arsenic-enrichment at one of the interfaces is considered the origin of asymmetry. To reveal actual band alignment, valence band model is modified focusing on the transition around heterojunctions. The enhanced photoluminescence intensity reflects the alleviation of hole confinement insufficiency and the enlargement of valence band offset. The results help to advance the understanding of the general problem of interface in nanostructures and provide guidance applicable to various scenarios for micro-macro correlation.

摘要

在将材料尺寸缩小到原子极限的趋势下,半导体异质结构中的界面具有越来越重要的意义。由于原子在界面周围的行为往往比在内部材料中更不规则,准确的能带对准成为一项重大挑战,而这决定了器件的最终性能。因此,迫切需要全面了解异质界面、能带和宏观性能之间的相互作用。在此,通过研究多量子阱激光器中具有相同制造参数的不对称异质界面来探索这种相互作用。这种意外的不对称源于异质界面周围的原子差异,它最终通过改变价带偏移来改善光学性质。分别通过几何相位分析和原位偏置电子全息术来表征异质界面周围的应变和电荷分布。将实验与理论相结合,认为其中一个界面处的砷富集是不对称的起源。为了揭示实际的能带对准,对价带模型进行了修改,重点关注异质结周围的跃迁。增强的光致发光强度反映了空穴限制不足的缓解和价带偏移的增大。这些结果有助于推进对纳米结构中界面一般问题的理解,并为适用于各种微观 - 宏观关联场景提供指导。

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