Lin Changqing, Li Yiran, Wei Qilin, Shen Qian, Cheng Yingchun, Huang Wei
Key Laboratory of Flexible Electronics & Institute of Advanced Materials, Jiangsu National Synergetic Innovation Center for Advanced Materials , Nanjing Tech University , 30 South Puzhu Road , Nanjing 211816 , China.
Shaanxi Institute of Flexible Electronics (SIFE) , Northwestern Polytechnical University (NPU) , 127 West Youyi Road , Xi'an , 710072 Shaanxi , China.
ACS Appl Mater Interfaces. 2019 May 22;11(20):18858-18864. doi: 10.1021/acsami.9b04843. Epub 2019 May 9.
Recently, single-layer CrI, a member of the chromium trihalides CrX (where X = Cl, Br, or I), has been exfoliated and experimentally demonstrated as an atomically thin material suitable for two-dimensional spintronics. Valley splitting due to the magnetic proximity effect has been demonstrated in a WSe/CrI van der Waals heterojunction. However, the understanding of the mechanisms behind the favorable performance of CrI is still limited. Here, we systematically study the carrier mobility and the intrinsic point defects in CrX and assess their influence on valley splitting in WSe/CrI by first-principles calculations. The flat-band nature induces extremely large carrier mass and ultralow carrier mobility. In addition, intrinsic point defects-localized states in the middle of the band gap-show deep transition energy levels and act as carrier recombination centers, further lowering the carrier mobility. Moreover, vacancies in CrI can enhance ferromagnetism and valley splitting in a WSe/CrI heterojunction, proving that chromium trihalides are excellent ferromagnetic insulators for spintronic and valleytronic applications.
最近,单层CrI,即三卤化铬CrX(其中X = Cl、Br或I)的一员,已被剥离并通过实验证明是一种适用于二维自旋电子学的原子级薄材料。在WSe/CrI范德华异质结中已证明了由于磁近邻效应导致的能谷分裂。然而,对CrI良好性能背后机制的理解仍然有限。在此,我们通过第一性原理计算系统地研究了CrX中的载流子迁移率和本征点缺陷,并评估了它们对WSe/CrI中能谷分裂的影响。平带性质导致极大的载流子质量和超低的载流子迁移率。此外,本征点缺陷——位于带隙中间的局域态——显示出深的跃迁能级并充当载流子复合中心,进一步降低了载流子迁移率。而且,CrI中的空位可以增强WSe/CrI异质结中的铁磁性和能谷分裂,证明三卤化铬是自旋电子学和能谷电子学应用的优秀铁磁绝缘体。