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密度泛函理论计算揭示超薄砷化镓(111)表面层的类金属能带结构和功函数变化

Density Functional Theory Calculations Revealing Metal-like Band Structures and Work Function Variation for Ultrathin Gallium Arsenide (111) Surface Layers.

作者信息

Tan Chih-Shan, Huang Michael H

机构信息

Department of Electrical and Computer Engineering, University of Toronto, 10 King's College Road, Toronto, Ontario, M5S 3G4, Canada.

Department of Chemistry, National Tsing Hua University, Hsinchu, 30013, Taiwan.

出版信息

Chem Asian J. 2019 Jul 1;14(13):2316-2321. doi: 10.1002/asia.201900597. Epub 2019 Jun 13.

Abstract

Density functional theory (DFT) calculations have been performed on tunable numbers of gallium arsenide (100), (110), and (111) planes for their electron density of states (DOS) plots and the corresponding band diagrams. The GaAs (100) and (110) planes show the same semiconducting band structure with tunable plane layers and a band gap of 1.35 eV around the Fermi level. In contrast, metal-like band structures are obtained with a continuous band structure around the Fermi level for 1, 2, 4, 5, 7, and 8 layers of GaAs (111) planes. For 3, 6, and 9 GaAs (111) planes, the same semiconducting band structure as seen in the (100) and (110) planes returns. The results suggest the GaAs {111} face should be more electrically conductive than its {100} and {110} faces, due to the merged conduction band and valence band. GaAs (100) and (110) planes give a fixed work function, but the (111) planes have variable work function values that are smaller than that obtained for the (100) and (110) planes. Furthermore, bond length, bond geometry, and frontier orbital electron number and energy distribution show notable differences between the metal-like and semiconducting plane cases, so the emergence of plane-dependent electronic properties have quantum mechanical origin at the orbital level. GaAs should possess similar facet-dependent electronic properties to those of Si and Ge.

摘要

已对可调数量的砷化镓(100)、(110)和(111)平面进行了密度泛函理论(DFT)计算,以获取其态密度(DOS)图和相应的能带图。砷化镓(100)和(110)平面显示出相同的半导体能带结构,具有可调的平面层数,并且在费米能级附近的带隙为1.35 eV。相比之下,对于1、2、4、5、7和8层的砷化镓(111)平面,在费米能级附近获得了具有连续能带结构的类金属能带结构。对于3、6和9层的砷化镓(111)平面,出现了与(100)和(110)平面中相同的半导体能带结构。结果表明,由于导带和价带合并,砷化镓{111}面的导电性应比其{100}和{110}面更强。砷化镓(100)和(110)平面具有固定的功函数,但(111)平面的功函数值可变,且小于(100)和(110)平面的功函数值。此外,键长、键几何形状以及前沿轨道电子数和能量分布在类金属平面和半导体平面的情况下显示出显著差异,因此平面相关电子性质的出现源于轨道水平的量子力学。砷化镓应具有与硅和锗类似的面相关电子性质。

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