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水介质中 UV-C 辐照、HO 光解和光-Fenton 过程耦合降解制霉菌素。

Degradation of Nystatin in aqueous medium by coupling UV-C irradiation, HO photolysis, and photo-Fenton processes.

机构信息

Laboratoire Génie de la Réaction, Faculté de Génie des Procédés et Génie Mécanique, U.S.T.H.B., BP 32, El Allia, Bab Ezzouar, Algeria.

Université Paris Est, Laboratoire Géomatériaux et Environnement, (EA 4508), UPEM, 77454, Marne-la-Vallée, France.

出版信息

Environ Sci Pollut Res Int. 2019 Aug;26(22):23149-23161. doi: 10.1007/s11356-019-05530-2. Epub 2019 Jun 12.

Abstract

Oxidative degradation and mineralization of the antifungal drug Nystatin (NYS) was investigated using photochemical advanced oxidation processes UV-C irradiation (280-100 nm), HO photolysis (UV/HO), and photo-Fenton (UV/HO/Fe). The effect of operating parameters such as [HO], [Fe], and [NYS] initial concentrations on degradation efficiency and mineralization ability of different processes was comparatively examined in order to optimize the processes. Photo-Fenton was found to be the most efficient process attaining complete degradation of 0.02 mM (19.2 mg L) NYS at 2 min and a quasi-complete mineralization (97%) of its solution at 5 h treatment while UV/HO and UV-C systems require significantly more time for complete degradation and lower mineralization degrees. The degradation and mineralization kinetics were affected by HO and Fe initial concentration, the optimum dosages being 4 mM and 0.4 mM, respectively. Consumption of HO during photo-Fenton treatment is very fast during the first 30 min leading to the appearance of two stages in the mineralization. The evolution of toxicity of treated solutions was assessed and confirmed the effectiveness of photo-Fenton process for the detoxification of NYS solution at the end of treatment. Application to real wastewater from pharmaceutical industry containing the target molecule NYS showed the effectiveness of photo-Fenton process since it achieved 92% TOC removal rate at 6-h treatment time.

摘要

采用光化学高级氧化工艺 UV-C 辐射(280-100nm)、HO 光解(UV/HO)和光芬顿(UV/HO/Fe)研究了抗真菌药物制霉菌素(NYS)的氧化降解和矿化。比较考察了[HO]、[Fe]和[NYS]初始浓度等操作参数对不同工艺降解效率和矿化能力的影响,以优化工艺。结果表明,光芬顿是最有效的工艺,在 2min 内完全降解 0.02mM(19.2mg/L)NYS,5h 处理后溶液的准完全矿化(97%),而 UV/HO 和 UV-C 系统完全降解和较低矿化度需要更长的时间。降解和矿化动力学受 HO 和 Fe 初始浓度的影响,最佳剂量分别为 4mM 和 0.4mM。在光芬顿处理过程中,HO 的消耗在最初的 30min 内非常快,导致矿化过程出现两个阶段。处理后溶液毒性的演变证实了光芬顿工艺对 NYS 溶液解毒的有效性,在处理结束时达到了 92%的TOC 去除率。应用于含有目标分子 NYS 的制药工业实际废水表明,光芬顿工艺有效,在 6h 处理时间内达到 92%的TOC 去除率。

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