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通过空化和点蚀效应增强富含缺陷的α-MoO纳米片的光催化性能。

Enhanced photocatalytic properties of defect-rich α-MoO nanoflakes by cavitation and pitting effect.

作者信息

Zheng Binjie, Wang Zegao, Wang Xinqiang, Chen Yuanfu

机构信息

State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 610054, China.

College of Materials Science and Engineering, Sichuan University, Chengdu, 610065, China; Interdisciplinary Nanoscience Center (iNANO), Aarhus University, Aarhus, DK-8000, Denmark.

出版信息

J Hazard Mater. 2019 Oct 15;378:120753. doi: 10.1016/j.jhazmat.2019.120753. Epub 2019 Jun 10.

Abstract

For the first time, we present a novel, facile and eco-friendly engineering defect method, to produce defect-rich α-MoO (dr-MoO) nanoflakes with abundant exposed reactive edge sites, by applying cavitation and pitting effect of high-power ultrasonic tip to inch-size α-MoO single crystals. The as-prepared dr-MoO nanoflakes deliver excellent photocatalytic activity for degradation of Rhodamine B (RhB) under visible light irradiation. The degradation apparent rate constant k of dr-MoO is as large as 5.9 × 10 min, which is ˜6.6 times higher than commercial α-MoO (com-MoO). The superior photocatalytic performance of dr-MoO is attributed to its rich exposed edges and slight expansion of interlayer space, which not only enhance the adsorption of HO and OH, provide abundant highly reactive sites, but also shorten the distance of photogenerated carriers moving to the reactive sites. This work provides new insights into the self-enhancement of α-MoO photocatalytic activities, which could be extended to other layered semiconductor photocatalysts.

摘要

首次,我们展示了一种新颖、简便且环保的工程缺陷方法,通过将高功率超声探头的空化和点蚀作用应用于英寸尺寸的α-MoO单晶,来制备具有大量暴露的活性边缘位点、富含缺陷的α-MoO(dr-MoO)纳米片。所制备的dr-MoO纳米片在可见光照射下对罗丹明B(RhB)的降解具有优异的光催化活性。dr-MoO的降解表观速率常数k高达5.9×10⁻³ min⁻¹,这比商业α-MoO(com-MoO)高约6.6倍。dr-MoO优异的光催化性能归因于其丰富的暴露边缘和层间空间的轻微扩展,这不仅增强了对·OH和OH⁻的吸附,提供了大量高活性位点,还缩短了光生载流子迁移到活性位点的距离。这项工作为α-MoO光催化活性的自增强提供了新的见解,这可以扩展到其他层状半导体光催化剂。

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