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采用紫外辐射亚氯酸铵复合体系法同时去除 SO 和 NO。

Simultaneous Removal of SO and NO Using a Novel Method of Ultraviolet Irradiating Chlorite-Ammonia Complex.

机构信息

Hebei Key Lab of Power Plant Flue Gas Multi-Pollutants Control, Department of Environmental Science and Engineering , North China Electric Power University , Baoding 071003 , PR China.

MOE Key Laboratory of Resources and Environmental Systems Optimization, College of Environmental Science and Engineering , North China Electric Power University , Beijing 102206 , PR China.

出版信息

Environ Sci Technol. 2019 Aug 6;53(15):9014-9023. doi: 10.1021/acs.est.8b06950. Epub 2019 Jul 10.

Abstract

A novel advanced oxidation process (AOP) using ultraviolet/sodium chlorite (UV/NaClO) is developed for simultaneous removal of SO and NO. NHOH, as an additive, was used to inhibit the generation of ClO and NO. The removal efficiencies of SO and NO reached 98.7 and 99.1%. NO removal was enhanced by greater UV light intensity and shorter wavelengths but was insensitive to changes in pH and temperature. SO at 500-1000 mg/m improved NO removal, especially in the absence of UV. The coexistence of SO and O facilitated the removal of NO by ClO. HCO, Cl, and Br enhanced NO removal, but their roles were negligible when UV was added. The generation of ClO and ClO/HO was verified by an UV-vis spectrometer, electron spin resonance (ESR), and radical-quenching tests. The mechanisms responsible for the removal of SO and NO were attributed to the synergism between acid-base neutralization and radical-induced oxidation. The ClO evolution and product composition were demonstrated by UV-vis and X-ray photoelectron spectroscopy (XPS). Kinetics analyses showed that the Hatta numbers were 329-798 and 747-1000 without and with UV. Thus, the gas-film resistance mainly controlled the mass-transfer process.

摘要

一种新型的高级氧化工艺(AOP),利用紫外/亚氯酸钠(UV/NaClO),同时去除 SO 和 NO。作为添加剂,NHOH 用于抑制 ClO 和 NO 的生成。SO 和 NO 的去除效率分别达到了 98.7%和 99.1%。NO 的去除率随着紫外光强度的增加和波长的缩短而提高,但对 pH 和温度的变化不敏感。500-1000mg/m3 的 SO 提高了 NO 的去除率,特别是在没有 UV 的情况下。SO 和 O 的共存有利于 ClO 去除 NO。HCO3-、Cl-和 Br-促进了 NO 的去除,但当添加 UV 时,它们的作用可以忽略不计。通过紫外可见分光光度计、电子顺磁共振(ESR)和自由基猝灭试验验证了 ClO 和 ClO/HO 的生成。SO 和 NO 去除的机理归因于酸碱中和与自由基诱导氧化的协同作用。通过紫外可见光谱和 X 射线光电子能谱(XPS)证明了 ClO 的演变和产物组成。动力学分析表明,在没有和有 UV 的情况下,Hatta 数分别为 329-798 和 747-1000。因此,气膜阻力主要控制着传质过程。

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