Visible-light-driven photocatalytic degradation of sulfamethazine by surface engineering of carbon nitride：Properties, degradation pathway and mechanisms.

Polymeric carbon nitride semiconductor has been explored as emerging metal-free photocatalyst for solving the energy shortage and environmental issues. However, the efficiency of carbon nitride is still not satisfying. Herein, a facile copolymerization between L-cysteine and dicyandiamide has been applied to forming the modified carbon nitride photocatalysts. The photocatalytic performance was evaluated through degrading sulfamethazine under visible light illumination. The ameliorative structure and tuned energy band result in visible-light adsorption enhancement. In addition, nitrogen vacancies offer more sites to adsorbing molecular oxygen, thereby facilitating the transfer of electrons from carbon nitride to the surface adsorbed oxygen. As a result, the degradation rate of optimized modified carbon nitride sample for sulfamethazine was 0.1062 min, which was almost 12 times than that of carbon nitride (0.0086 min). Superoxide radicals and holes were mainly responsible for the sulfamethazine photodegradation by modified carbon nitride. Two reaction intermediates/products were observed and identified by high performance liquid chromatography-mass spectrometer, and a possible reaction pathway was proposed. This study provides new insights into the design of highly efficient photocatalyst for other organic pollutants degradation.