Correlated TKD/EDS - TEM - APT analysis on selected interfaces of CoSi thin films.

Correlative analysis is a powerful way to relate crystallographic and chemical information to the properties of materials. In this work, a procedure is proposed to select and analyze interfaces of polycrystalline thin film materials through correlative transmission Kikuchi diffraction/energy dispersive X-ray spectroscopy (TKD/EDS), transmission electron microscopy (TEM) and atom probe tomography (APT). TKD provides information on the crystallographic orientation. The EDS analysis performed together with TKD in the scanning electron microscope (SEM) makes chemical information available allowing phases of similar crystal structure, but with a different composition to be distinguished. The information of TKD/EDS can be correlated to successive TEM and APT analysis on selected interfaces for structural and chemical analysis at the atomic scale. An interface of an epitaxial orientated grain of a polycrystalline CoSi thin film on (111)Si is selected and analyzed. The selected interface has a twin character and shows facets of different orientation and area. Site-specific segregation of Ge to junctions of the facets is evidenced. The correlation between local strain from misfit (defects) at the interface and segregation is discussed.