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用于按需无掩膜光刻的快速声光雕刻

Fast Acoustic Light Sculpting for On-Demand Maskless Lithography.

作者信息

Surdo Salvatore, Duocastella Martí

机构信息

Nanophysics Istituto Italiano di Tecnologia Via Morego 30 16163 Genova Italy.

出版信息

Adv Sci (Weinh). 2019 May 15;6(14):1900304. doi: 10.1002/advs.201900304. eCollection 2019 Jul 17.

DOI:10.1002/advs.201900304
PMID:31380209
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6662050/
Abstract

Light interference is the primary enabler of a number of optical maskless techniques for the large-scale processing of materials at the nanoscale. However, methods controlling interference phenomena can be limited in speed, ease of implementation, or the selection of pattern designs. Here, an optofluidic system that employs acoustic standing waves in a liquid to produce complex interference patterns at sub-microsecond temporal resolution, faster than the pulse-to-pulse period of many commercial laser systems, is presented. By controlling the frequency of the acoustic waves and the motion of a translation stage, additive and subtractive direct-writing of tailored patterns over cm areas with sub-wavelength uniformity in periodicity and scalable spatial resolution, down to the nanometric range, are demonstrated. Such on-the-fly dynamic control of light enhances throughput and design flexibility of optical maskless lithography, helping to expand its application portfolio to areas as important as plasmonics, electronics, or metamaterials.

摘要

光干涉是多种用于纳米级材料大规模加工的光学无掩膜技术的主要促成因素。然而,控制干涉现象的方法在速度、实施的简易程度或图案设计的选择方面可能存在局限性。在此,提出了一种光流体系统,该系统利用液体中的声驻波以亚微秒级的时间分辨率产生复杂的干涉图案,其速度比许多商用激光系统的脉冲到脉冲周期还要快。通过控制声波频率和平移台的运动,展示了在厘米区域上以亚波长周期性均匀性和可扩展至纳米范围的空间分辨率进行定制图案的加法和减法直接写入。这种对光的实时动态控制提高了光学无掩膜光刻的吞吐量和设计灵活性,有助于将其应用范围扩展到诸如等离子体学、电子学或超材料等重要领域。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/3f3d41fde2cd/ADVS-6-1900304-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/f538aec428a5/ADVS-6-1900304-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/851aab34c444/ADVS-6-1900304-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/1b5bfcfeba14/ADVS-6-1900304-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/3f3d41fde2cd/ADVS-6-1900304-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/f538aec428a5/ADVS-6-1900304-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/851aab34c444/ADVS-6-1900304-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/1b5bfcfeba14/ADVS-6-1900304-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e3c6/6662050/3f3d41fde2cd/ADVS-6-1900304-g004.jpg

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