Department of Chemistry and Institute for Computational Molecular Science (ICMS), Temple University, Philadelphia, 19122, USA.
Theoretical Sciences Unit, Jawaharlal Nehru Centre for Advanced Scientific Research, P.O Jakkur, Bangalore 560064, India.
Nanoscale. 2019 Nov 7;11(41):19398-19407. doi: 10.1039/c9nr04096j. Epub 2019 Aug 5.
Development of inexpensive and efficient photo- and electro-catalysts is vital for clean energy applications. Electronic and structural properties can be tuned by the introduction of defects to achieve the desirable electrocatalytic activity. Using first-principles molecular dynamics simulations, the structural, dynamical, and electronic properties of 2D borocarbonitride (h-BCN) sheets have been investigated, highlighting how anti-site defects in B and N doped graphene significantly influence the bandgap, and thereby open up new avenues to tune the chemical behavior of the 2D sheets. In the present work, all of the monolayers investigated display direct bandgaps, which reduce from 0.99 eV to 0.24 eV with increasing number of anti-site defects. The present results for the electronic structure and findings for bandgap engineering open up applications of BCN monolayers in optoelectronic devices and solar cells. The influence of the anti-site distribution of B and N atoms on the ultra-high hole/electron mobility and conductivity is discussed based on density functional theory coupled with the Boltzmann transport equation. The BCN defect monolayer is predicted to have carrier mobilities three times higher than that of the pristine sheet. The present results demonstrate that BN doped graphene monolayers are likely to be useful in the next-generation 2D field-effect transistors.
开发廉价高效的光催化剂和电催化剂对于清洁能源的应用至关重要。通过引入缺陷可以调整电子和结构性质,从而获得理想的电催化活性。本文采用第一性原理分子动力学模拟,研究了二维硼碳氮(h-BCN)片的结构、动力学和电子性质,强调了 B 和 N 掺杂石墨烯中的反位缺陷如何显著影响带隙,从而为调节二维片的化学行为开辟了新途径。在本工作中,所有研究的单层均显示出直接带隙,随着反位缺陷数量的增加,带隙从 0.99 eV 减小到 0.24 eV。本研究中电子结构的结果和带隙工程的发现为 BCN 单层在光电设备和太阳能电池中的应用开辟了道路。基于密度泛函理论与玻尔兹曼输运方程相结合,讨论了 B 和 N 原子反位分布对超高空穴/电子迁移率和电导率的影响。预测 BCN 缺陷单层的载流子迁移率比原始单层高 3 倍。本研究结果表明,BN 掺杂石墨烯单层在下一代二维场效应晶体管中可能具有应用潜力。