Maliar Tatjana, Cesiulis Henrikas, Podlaha Elizabeth J
Department of Chemical Engineering, Northeastern University, Boston, MA, United States.
Department of Physical Chemistry, Vilnius University, Vilnius, Lithuania.
Front Chem. 2019 Aug 2;7:542. doi: 10.3389/fchem.2019.00542. eCollection 2019.
The electrodeposition of Fe-Co-W alloys was examined using a rotating cylinder Hull (RCH) cell and conditions were determined to create nanowires. The metal ion reduction mechanism was a combination of induced and anomalous codeposition, with water reduction as a gas evolving side reaction, rending deposition into recesses a challenge. In thin film deposition, under kinetic control, the addition of Fe ions into the electrolyte, greatly reduced the Co partial current density, and thus it's content in the deposit. The change of Co partial current density was attributed to an anomalous codeposition behavior, but it had a minimal effect in changing the W wt% in the deposit, despite the expected inducing characteristic of Fe when codeposited with tungsten. Deposition conditions were determined to electrodeposit Fe-Co-W nanowires having similar concentration as the thin films. Nanowires were electrodeposited into polycarbonate membranes under pulsed current at room temperature.
使用旋转圆柱赫尔槽（RCH）电池对铁钴钨合金的电沉积进行了研究，并确定了制备纳米线的条件。金属离子还原机制是诱导共沉积和异常共沉积的组合，析氢反应作为析气副反应，使得在凹槽中沉积具有挑战性。在薄膜沉积中，在动力学控制下，向电解液中添加铁离子会大大降低钴的分电流密度，从而降低其在沉积物中的含量。钴分电流密度的变化归因于异常共沉积行为，尽管铁与钨共沉积时具有预期的诱导特性，但它对沉积物中钨的重量百分比变化影响最小。确定了沉积条件，以电沉积出与薄膜浓度相似的铁钴钨纳米线。在室温下，通过脉冲电流将纳米线电沉积到聚碳酸酯膜中。
