Zhong Chaorong, Lin Lina, Qi Ruijuan, Cheng Yan, Gao Xingsen, Huang Rong
Key Laboratory of Polar Materials and Devices (MOE) and Department of Electronics, East China Normal University, Shanghai 200062, China; School of Physics and Telecommunication Engineering, Yulin Normal University, Yulin, Guangxi 537000, China.
Key Laboratory of Polar Materials and Devices (MOE) and Department of Electronics, East China Normal University, Shanghai 200062, China.
Ultramicroscopy. 2019 Dec;207:112840. doi: 10.1016/j.ultramic.2019.112840. Epub 2019 Sep 3.
Recently, there are growing demands on focus ion beam (FIB) sample preparation technique in plan-view geometry because it can provide the in-plane microstructure information of thin film and allows direct correlations of the atomic structure via transmission electron microscopy with micrometer-scale property measurements. However, one main technical difficulty is to position the buried thin film accurately in a sandwich structure. In this paper, an on-line positioning method based on the thickness monitoring by EDS is introduced, where the intensities of the characteristic X-ray peaks from different layers are proportional to the relative thickness of them at the same acquisition conditions. A high density array of ∼100 nm squares BiFeO nanodots with ∼ 25 nm thickness grown on a 20 nm thick SrRuO bottom electrode and (001)-oriented SrTiO substrate is selected for demonstration. By monitoring the intensities of Pt-M, Sr-L, Ti-K, Ru-L, Fe-K and Bi-M peaks, the relative thickness of Pt protection layer, the BiFeO, SrRuO and SrTiO can be obtained, which provide accurate position of the BFO nanodots array in the thickness direction. With these information, the cutting parameters are optimized and a high quality plan-view specimen of BFO nanodots array is prepared, which is confirmed by high resolution transmission electron microscopy. This positioning method should have a wide application for material science.
