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通过闪光热解真空紫外光电离飞行时间质谱和密度泛函理论对六甲基二硅烷热分解的机理研究。

Mechanistic Study of Thermal Decomposition of Hexamethyldisilane by Flash Pyrolysis Vacuum Ultraviolet Photoionization Time-of-Flight Mass Spectrometry and Density Functional Theory.

机构信息

Key Laboratory for Power Machinery and Engineering of Ministry of Education (MOE) , Shanghai Jiao Tong University , Shanghai 200240 , PR China.

Department of Chemistry , University of California , Riverside , California 92521 , United States.

出版信息

J Phys Chem A. 2019 Dec 12;123(49):10520-10528. doi: 10.1021/acs.jpca.9b08102. Epub 2019 Nov 25.

DOI:10.1021/acs.jpca.9b08102
PMID:31710488
Abstract

Thermal decomposition of hexamethyldisilane (HMDS) was studied from room temperature to 1310 K using flash pyrolysis vacuum ultraviolet single-photon ionization time-of-flight mass spectrometry (VUV-SPI-TOFMS). Decomposition pathways of HMDS and initial reaction intermediates were also investigated using density functional theory (DFT) at the B3LYP/6-311++G(d,p) level. Unimolecular decomposition reactions of HMDS involving Si-Si and Si-C bond cleavage, as well as decomposition producing MeSi and :SiMe via a three-centered elimination, were determined as the initiation reactions. MeSiSi(Me), MeSi, MeSi, and :SiMe were major products of the initiation reactions. These initial products were apt to decompose by homolytic reactions. MeSi═CH, :SiMe, and other silene/silylene intermediates preferred decomposing through molecular eliminations. Both homolytic and molecular elimination reactions are important in the pyrolysis of HMDS.

摘要

使用闪光热解真空紫外单光子电离飞行时间质谱(VUV-SPI-TOFMS),从室温到 1310 K 研究了六甲基二硅烷(HMDS)的热分解。还使用密度泛函理论(DFT)在 B3LYP/6-311++G(d,p)水平上研究了 HMDS 的分解途径和初始反应中间体。涉及 Si-Si 和 Si-C 键断裂的 HMDS 的单分子分解反应,以及通过三中心消除生成 MeSi 和 :SiMe 的分解,被确定为引发反应。MeSiSi(Me)、MeSi、MeSi 和 :SiMe 是引发反应的主要产物。这些初始产物容易通过均裂反应分解。MeSi═CH、:SiMe 和其他硅烯/硅烷中间体更喜欢通过分子消除分解。均裂和分子消除反应在 HMDS 的热解中都很重要。

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