Asaji Toyohisa, Uyama Hiroya, Umetsugu Takuro, Nakamura Tsubasa, Hitobo Takeshi, Kato Yushi
National Institute of Technology, Toyama College, 13 Hongo-machi, Toyama City, Toyama 939-8630, Japan.
National Institute of Technology, Oshima College, 1091-1 Komatsu, Suouoshima, Yamaguchi 742-2193, Japan.
Rev Sci Instrum. 2019 Dec 1;90(12):123508. doi: 10.1063/1.5127348.
A desktop-sized ion beam processing system with an inexpensive electron cyclotron resonance (ECR) ion source has been developed for industrial applications at the National Institute of Technology, Toyama College. A commercially available 1.2- to 1.3-GHz transceiver is adopted as a microwave source to generate the ECR plasma. The minimum-B magnetic field is formed by arranging small rectangular permanent magnets. A Wien filter with orthogonal electric and magnetic fields is employed as a beam separator. At the end of the beam line, a processing chamber with a substrate stage for ion beam applications, such as ion implantation and microfabrication, is installed. Here, we report the results of the first experiment. Ar ion beams with a current of approximately 62 µA were obtained at an extraction voltage of 4 kV. In addition, we demonstrate that Ar and Xe ions can be separated by the Wien filter.
富山工业大学开发了一种配备廉价电子回旋共振（ECR）离子源的桌面尺寸离子束处理系统，用于工业应用。采用市售的1.2至1.3 GHz收发器作为微波源来产生ECR等离子体。通过排列小矩形永久磁铁形成最小B磁场。采用具有正交电场和磁场的维恩滤波器作为束分离器。在束线末端，安装了一个带有用于离子注入和微加工等离子束应用的衬底台的处理室。在此，我们报告首次实验的结果。在4 kV的提取电压下获得了电流约为62 µA的氩离子束。此外，我们证明了氩离子和氙离子可以通过维恩滤波器分离。
