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通过飞秒激光写入制备凸面二氧化硅微透镜阵列

Convex silica microlens arrays via femtosecond laser writing.

作者信息

Hua Jian-Guan, Ren Hang, Jia Ao, Tian Zhen-Nan, Wang Lei, Juodkazis Saulius, Chen Qi-Dai, Sun Hong-Bo

出版信息

Opt Lett. 2020 Feb 1;45(3):636-639. doi: 10.1364/OL.378606.

DOI:10.1364/OL.378606
PMID:32004271
Abstract

We report fabrication of silica convex microlens arrays with controlled shape, size, and curvature by femtosecond laser direct writing. A backside etching in dye solution was utilized for laser machining high-fidelity control of material removal and real-time surface cleaning from ablation debris. Thermal annealing was applied to reduce surface roughness to 3 nm (rms). The good optical performance of the arrays was confirmed by focusing and imaging tests. Complex 3D micro-optical elements over a footprint of $ 100 \times 100;\unicode{x00B5}{{\rm m}^2} $100×100µm were ablated within 1 h (required for practical applications). A material removal speed of $ 120;\unicode{x00B5}{{\rm m}^3}/{\rm s} $120µm/s ($ 6 \times {10^5} ;{{\rm nm}^3}/{\rm pulse} $6×10nm/pulse) was used, which is more than an order of magnitude higher compared to backside etching using a mask projection method. The method is applicable for fabrication of micro-optical components on transparent hard materials.

摘要

我们报告了通过飞秒激光直写技术制造具有可控形状、尺寸和曲率的二氧化硅凸微透镜阵列。利用在染料溶液中的背面蚀刻技术进行激光加工,以实现对材料去除的高保真控制以及从烧蚀碎片中实时清洁表面。通过热退火将表面粗糙度降低至3纳米(均方根值)。通过聚焦和成像测试证实了阵列具有良好的光学性能。在1小时内(实际应用所需时间)烧蚀了面积为100×100微米的复杂三维微光学元件。使用的材料去除速度为120微米³/秒(6×10⁵纳米³/脉冲),与使用掩膜投影法的背面蚀刻相比,该速度高出一个数量级以上。该方法适用于在透明硬质材料上制造微光学元件。

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