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在工程化磁性拓扑绝缘体异质结构中定制混合反常霍尔响应

Tailoring the Hybrid Anomalous Hall Response in Engineered Magnetic Topological Insulator Heterostructures.

作者信息

Chen Peng, Zhang Yong, Yao Qi, Tian Fugu, Li Lun, Qi Zhengkun, Liu Xiaoyang, Liao Liyang, Song Cheng, Wang Jingyuan, Xia Jing, Li Gang, Burn David M, van der Laan Gerrit, Hesjedal Thorsten, Zhang Shilei, Kou Xufeng

机构信息

Key Lab Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.

Department of Physics and Astronomy, University of California, Irvine, California 92697, United States.

出版信息

Nano Lett. 2020 Mar 11;20(3):1731-1737. doi: 10.1021/acs.nanolett.9b04932. Epub 2020 Feb 5.

Abstract

Engineering the anomalous Hall effect (AHE) is the key to manipulate the magnetic orders in the emerging magnetic topological insulators (MTIs). In this letter, we synthesize the epitaxial BiTe/MnTe magnetic heterostructures and observe pronounced AHE signals from both layers combined together. The evolution of the resulting hybrid AHE intensity with the top BiTe layer thickness manifests the presence of an intrinsic ferromagnetic phase induced by the topological surface states at the heterolayer interface. More importantly, by doping the BiTe layer with Sb, we are able to manipulate the sign of the Berry phase-associated AHE component. Our results demonstrate the unparalleled advantages of MTI heterostructures over magnetically doped TI counterparts in which the tunability of the AHE response can be greatly enhanced. This in turn unveils a new avenue for MTI heterostructure-based multifunctional applications.

摘要

调控反常霍尔效应(AHE)是操控新兴磁性拓扑绝缘体(MTIs)中磁序的关键。在本信函中,我们合成了外延BiTe/MnTe磁性异质结构,并观测到两层组合在一起时显著的反常霍尔效应信号。所得混合反常霍尔效应强度随顶部BiTe层厚度的演变表明,在异质层界面处存在由拓扑表面态诱导的本征铁磁相。更重要的是,通过用Sb掺杂BiTe层,我们能够操控与贝里相位相关的反常霍尔效应分量的符号。我们的结果表明,MTI异质结构相对于磁性掺杂的拓扑绝缘体对应物具有无与伦比的优势,其中反常霍尔效应响应的可调性可以大大增强。这反过来又为基于MTI异质结构的多功能应用开辟了一条新途径。

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