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通过共轭聚合物调节小型半导体二维材料的光学带隙

Modulating the Optical Band Gap of Small Semiconducting Two-Dimensional Materials by Conjugated Polymers.

作者信息

Liao Chih-Kai, Phan Jasmine, Martinez-Barron Heber, Mahmoud Mahmoud A

机构信息

Department of Biomedical Engineering and Chemical Engineering, The University of Texas at San Antonio, One UTSA Circle, San Antonio, Texas 78249, United States.

Department of Mechanical Engineering, The University of Texas at San Antonio, One UTSA Circle, San Antonio, Texas 78249, United States.

出版信息

Langmuir. 2020 Mar 17;36(10):2574-2583. doi: 10.1021/acs.langmuir.9b03335. Epub 2020 Mar 5.

Abstract

Ultra-high-resolution optical microscopic techniques are used to measure the reflectance and photoluminescence (PL) spectrum of individual monolayered MoS of dimensions below 200 × 200 nm, while placed on top of a thin film conjugated polymer (CP). p-type and n-type CPs such as poly(3-hexylthiophene-2,5-diyl) (P3HT) and [6,6]-phenyl C61 butyric acid methyl ester (PCBM), respectively, modified the optical band gap of the MoS sheet differently. However, the optical band gap is decreased after integration with P3HT, while it is increased after being combined with PCBM. The acceptable reason for the modification of the band gap of MoS by CPs is the generation of interlayer excitons (ILE) at their interface. The optical band gap of MoS is further changed by introducing an inert polymer spacer of different thickness to separate MoS from the CP. This is attributed to the reduction of the efficiency of excitonic interactions and lowering the exciton binding energy, which is induced by the increase of the dielectric function at the CP-MoS interface. No sign of electron injection to the conduction band of MoS after integration with P3HT or PCBM, as no significant shift of the A Raman band of MoS was measured on top of CPs, which is sensitive to the electron injection.

摘要

超高分辨率光学显微镜技术用于测量尺寸小于200×200 nm的单个单层MoS在置于共轭聚合物(CP)薄膜之上时的反射率和光致发光(PL)光谱。p型和n型CP,如聚(3 - 己基噻吩 - 2,5 - 二基)(P3HT)和[6,6] - 苯基C61丁酸甲酯(PCBM),分别以不同方式改变了MoS片的光学带隙。然而,与P3HT整合后光学带隙减小,而与PCBM结合后光学带隙增大。CP对MoS带隙进行修饰的合理原因是在它们的界面处产生了层间激子(ILE)。通过引入不同厚度的惰性聚合物间隔层将MoS与CP隔开,MoS的光学带隙进一步发生变化。这归因于激子相互作用效率的降低以及激子结合能的降低,这是由CP - MoS界面处介电函数的增加所引起的。与P3HT或PCBM整合后,没有迹象表明电子注入到MoS的导带,因为在CP之上测量到的MoS的A拉曼带没有明显位移,该拉曼带对电子注入很敏感。

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