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单层 MoS2 中直接和间接带隙的高效激子型光致发光。

Efficient Excitonic Photoluminescence in Direct and Indirect Band Gap Monolayer MoS2.

机构信息

Institut für Theoretische Physik, Universität Bremen , P.O. Box 330 440, 28334 Bremen, Germany.

Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 440-746, Republic of Korea.

出版信息

Nano Lett. 2015 Oct 14;15(10):6841-7. doi: 10.1021/acs.nanolett.5b02719. Epub 2015 Sep 2.

DOI:10.1021/acs.nanolett.5b02719
PMID:26322814
Abstract

We discuss the photoluminescence (PL) of semiconducting transition metal dichalcogenides on the basis of experiments and a microscopic theory. The latter connects ab initio calculations of the single-particle states and Coulomb matrix elements with a many-body description of optical emission spectra. For monolayer MoS2, we study the PL efficiency at the excitonic A and B transitions in terms of carrier populations in the band structure and provide a quantitative comparison to an (In)GaAs quantum well-structure. Suppression and enhancement of PL under biaxial strain is quantified in terms of changes in the local extrema of the conduction and valence bands. The large exciton binding energy in MoS2 enables two distinctly different excitation methods: above-band gap excitation and quasi-resonant excitation of excitonic resonances below the single-particle band gap. The latter case creates a nonequilibrium distribution of carriers predominantly in the K-valleys, which leads to strong emission from the A-exciton transition and a visible B-peak even if the band gap is indirect. For above-band gap excitation, we predict a strongly reduced emission intensity at comparable carrier densities and the absence of B-exciton emission. The results agree well with PL measurements performed on monolayer MoS2 at excitation wavelengths of 405 nm (above) and 532 nm (below the band gap).

摘要

我们基于实验和微观理论讨论了半导体过渡金属二卤化物的光致发光(PL)。后者将单粒子态和库仑矩阵元的从头算计算与光学发射光谱的多体描述联系起来。对于单层 MoS2,我们研究了能带结构中载流子浓度对 A 和 B 激子跃迁的 PL 效率,并与(In)GaAs 量子阱结构进行了定量比较。双轴应变下 PL 的抑制和增强可以根据导带和价带局部极值的变化来量化。MoS2 中的大激子结合能使两种截然不同的激发方法成为可能:带隙以上的激发和带隙以下的激子共振的准共振激发。后一种情况主要在 K 谷中产生载流子的非平衡分布,这导致 A-激子跃迁的强发射和可见的 B-峰,即使能带隙是间接的。对于带隙以上的激发,我们预测在可比的载流子密度下,发射强度会大大降低,并且没有 B-激子发射。结果与在 405nm(带隙以上)和 532nm(带隙以下)激发波长下对单层 MoS2 进行的 PL 测量结果非常吻合。

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