Huang Zhaoling, Zeng Qi, Hui Yun, Alahi Md Eshrat E, Qin Shuijie, Wu Tianzhun
Guizhou University, Guiyang, Guizhou 550025, China.
Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China.
ACS Appl Mater Interfaces. 2020 Mar 25;12(12):14495-14506. doi: 10.1021/acsami.9b19875. Epub 2020 Mar 10.
Dopamine (DA) and its derivatives are promising for the fabrication of functional films and devices with excellent conductivity and long-term stability; nevertheless its polymerization process is typically prolonged. We have proposed the accelerated deposition process using ultraviolet (UV) irradiation with the existence of nanotitanium dioxide (nano-TiO) in order to realize the rapid and stable synthesis of polydopamine (PDA) films. The deposition process of nanostructured coatings such as platinum nanowire (PtNW) was also proposed by reducing the time of polymerization process to less than 1 h. It also increased the platinum (Pt) chelating rate with PDA, which was about 12 times faster than the traditional photo-oxidation method. Compared with the electrodes of the same size based on Ti/Pt sputtering, the impedance of the proposed PDA/TiO/PtNW coated electrode was as low as 0.0968 ± 0.0054 kΩ at 1 kHz (reduction of 99.74%). An extremely high cathodic charge storage capacity (CSC) up to 234.4 ± 3.16 mC cm was also observed, which was about 106.5 and 1.6 times higher than that of Ti/Pt and PDA/PtNW electrodes, respectively. In addition to that, significant photocurrent polarization responses were presented for PDA/TiO/PtNW electrodes with a stable current of -136.1 μA, exhibiting excellent charge transfer and UV absorption capacities. This co-deposition method has demonstrated great potential to speed up the polymerization process and enhance the electrical performance for flexible electrodes.
多巴胺（DA）及其衍生物有望用于制造具有优异导电性和长期稳定性的功能薄膜及器件；然而其聚合过程通常较为漫长。我们提出了一种在纳米二氧化钛（nano-TiO₂）存在的情况下利用紫外线（UV）辐照的加速沉积工艺，以实现聚多巴胺（PDA）薄膜的快速稳定合成。通过将聚合过程的时间缩短至1小时以内，还提出了诸如铂纳米线（PtNW）等纳米结构涂层的沉积工艺。这也提高了铂（Pt）与PDA的螯合速率，比传统的光氧化方法快约12倍。与基于Ti/Pt溅射的相同尺寸电极相比，所提出的PDA/TiO₂/PtNW涂层电极在1 kHz时的阻抗低至0.0968±0.0054 kΩ（降低了99.74%）。还观察到极高的阴极电荷存储容量（CSC）高达234.4±3.16 mC cm⁻²，分别比Ti/Pt和PDA/PtNW电极高约106.5倍和1.6倍。除此之外，PDA/TiO₂/PtNW电极呈现出显著的光电流极化响应，稳定电流为 -136.1 μA，表现出优异的电荷转移和紫外线吸收能力。这种共沉积方法已显示出在加速聚合过程和提高柔性电极电性能方面的巨大潜力。
