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一种减轻类金刚石涂层高功率脉冲磁控溅射沉积过程中微弧现象的策略。

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings.

作者信息

Vitelaru Catalin, Parau Anca Constantina, Constantin Lidia Ruxandra, Kiss Adrian Emil, Vladescu Alina, Sobetkii Arcadie, Kubart Tomas

机构信息

National Institute of Research and Development for Optoelectronics-INOE 2000, 409 Atomistilor St., P.O.Box MG 05, 077125 Magurele-Bucharest, Romania.

National Research Tomsk Polytechnic University, Lenin Avenue 43, 634050 Tomsk, Russia.

出版信息

Materials (Basel). 2020 Feb 26;13(5):1038. doi: 10.3390/ma13051038.

DOI:10.3390/ma13051038
PMID:32110856
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7084500/
Abstract

In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at -100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10 mm Nm.

摘要

在本工作中，我们研究了使用高功率脉冲磁控溅射（HiPIMS）在硅和钢基底上沉积微米厚类金刚石碳（DLC）涂层。通过简单的钛中间层确保两种基底上的附着力，同时通过在基底上施加-100 V直流自偏压的射频（RF）偏压来调节入射离子的能量。研究了在工作的Ar+Ne气氛中添加乙炔作为Ar溅射的替代方法，以提高工艺稳定性和涂层质量。保持峰值电流恒定，以便对本研究中使用的不同沉积条件进行可靠比较。在Ar+Ne气体混合物中添加乙炔的主要优点是，与Ar+Ne工艺相比，沉积速率提高了2倍。此外，由于电弧减少，表面缺陷数量从约40%的表面缺陷覆盖率降至约1%。对于所有研究的气体成分，沉积的DLC薄膜的机械和摩擦学性能保持相当。所有涂层的纳米压痕硬度在25至30 GPa范围内，摩擦系数在0.05至0.1之间，磨损率在0.47至0.77×10⁻⁶ mm³/Nm范围内。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/ef8606add5e6/materials-13-01038-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/1f6c8d09f316/materials-13-01038-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/0b2da8ee3ba0/materials-13-01038-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/041d25cbda8f/materials-13-01038-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/5a20cb72ff5c/materials-13-01038-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/b97bdb0f9148/materials-13-01038-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/5183e6d3c61e/materials-13-01038-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/c118797b2e31/materials-13-01038-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/865c0d9bfbad/materials-13-01038-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/ef8606add5e6/materials-13-01038-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/1f6c8d09f316/materials-13-01038-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/0b2da8ee3ba0/materials-13-01038-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/041d25cbda8f/materials-13-01038-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/5a20cb72ff5c/materials-13-01038-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/b97bdb0f9148/materials-13-01038-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/5183e6d3c61e/materials-13-01038-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/c118797b2e31/materials-13-01038-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/865c0d9bfbad/materials-13-01038-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/46bc/7084500/ef8606add5e6/materials-13-01038-g009.jpg

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