Defect-enhanced photocatalytic removal of dimethylarsinic acid over mixed-phase mesoporous TiO.

Much attention has been paid to the pollutant dimethylarsenic acid (DMA), because of its high toxicity even at very low doses. Although TiO photocatalytic oxidation (PCO) is one of the few effective methods for treating DMA-containing water, the efficient decomposition of DMA and simultaneous removal of toxic arsenic species remains a significant but challenging task. Here, defective mesoporous TiO with mixed-phase structure was synthesized and used as both photocatalyst and adsorbent for DMA removal. Due to the reduced band-gap and enhanced separation of photogenerated charge carriers, the oxygen-deficient TiO nanostructures exhibited 4.2 times higher PCO efficiency than commercial TiO (P25). More importantly, the high surface area of the mesoporous TiO provided sufficient active sites for in-situ adsorption and reaction, resulting in the efficient removal of as-formed As(V). Combining the experimental and characterization results, the different roles of reactive species during PCO reactions were clarified. In the presence of hole (h) as the dominant oxidation species, DMA was demethylated and transformed into MMA. Thereafter, MMA was subsequently reduced to As(III) by photo-generated electrons. Superoxide radicals (O) played a significant role in oxidizing As(III) into As(V), which was finally adsorptively removed by the mesoporous TiO.