Department of Chemistry, Birla Institute of Technology and Science (BITS) Pilani, Hyderabad Campus, Jawahar Nagar, Kapra Mandal, Hyderabad, 500078, India.
Department of Chemical Engineering, Birla Institute of Technology and Science (BITS) Pilani, Hyderabad Campus, Jawahar Nagar, Kapra Mandal, Hyderabad, 500078, India.
J Hazard Mater. 2020 Jul 5;393:122491. doi: 10.1016/j.jhazmat.2020.122491. Epub 2020 Mar 7.
The adsorption with highly porous adsorbents is an efficient technique to trap the uncontrolled release of antibiotics in the environment, however, mere adsorption does not mineralize the discharged antibiotics. On the contrary, the regular photocatalysts completely mineralize the antibiotics, however suffers from high efficiency due to comparatively low surface area and porosity. In this work, a balance has been made between efficient adsorption followed by complete degradation of the adsorbed antibiotic over ZIF-8 derived ZnO/N-doped carbon composite. The nitrogen-doped carbon produced at 1000 °C showed a very high adsorption capacity of SMX, due to higher surface area, porosity and better surface interaction between adsorbate and adsorbent. The ZnO formed at 600 °C produced sufficient OH· that were responsible to show a very high rate of complete photocatalytic mineralization of SMX over the material. The ZnO/N-doped carbon composite showed a very high rate of photodegradation with a corresponding rate constant of 4.36 × 10 min. The complete degradation mechanism was proposed and rates were compared with existing literature.
采用高多孔吸附剂吸附是一种有效捕获抗生素在环境中失控释放的技术，但单纯的吸附并不能使排出的抗生素矿化。相反，常规光催化剂能完全矿化抗生素，但由于比表面积和孔隙率相对较低，效率较低。在这项工作中，通过在 ZIF-8 衍生的 ZnO/N 掺杂碳复合材料上进行有效的吸附，然后对吸附的抗生素进行完全降解，在两者之间取得了平衡。在 1000°C 下制备的氮掺杂碳由于具有更高的比表面积、孔隙率和吸附质与吸附剂之间更好的表面相互作用，对 SMX 表现出非常高的吸附能力。在 600°C 下形成的 ZnO 产生了足够的 OH·，这是在该材料上实现 SMX 完全光催化矿化的高速率的原因。ZnO/N 掺杂碳复合材料具有非常高的光降解速率，相应的速率常数为 4.36×10−2 min−1。提出了完全降解的机制，并与现有文献进行了比较。
