Liu Lei, Diao Yu, Xia Sihao
Department of Optoelectronic Technology, School of Electronic and Optical Engineering, Nanjing University of Science and Technology, Nanjing 210094, China.
Department of Optoelectronic Technology, School of Electronic and Optical Engineering, Nanjing University of Science and Technology, Nanjing 210094, China.
J Colloid Interface Sci. 2020 Jul 15;572:297-305. doi: 10.1016/j.jcis.2020.03.100. Epub 2020 Mar 29.
The influence of CO, CO, HO, H and CH adsorption on the stability and electronic properties of negative electron affinity (NEA) GaAs nanowire surfaces activated by Cs/O and Cs/NF are systematically investigated via first-principles. The calculations indicated that GaAs nanowires activated with 3Cs/O are more susceptible to the surface contamination. After residual gas molecule adsorption, 3Cs/O activated surfaces exhibit direct bandgap character, while 3Cs/NF activated surfaces are inversely indirect bandgap. In addition, residual gas adsorption results in a notable increase of band gap, work function and electron affinity of GaAs nanowire surfaces. The incoporation of residual gas molecules also induces a new electric dipole [Cs-gas] with a direction from Cs to gas molecule. From the perspective of theoretical calculation, it is predicted that GaAs nanowires activated through Cs/NF has a stronger stability compared with Cs/O in the aspect of gas exposure.