Li Xing, Tang Jing, Zhang Xuelian, Zhang Ruirui, Zeng Xiangyu, Zhan Zijun, Liu Chunxiang, Cheng Chuanfu
Shandong Provincial Engineering and Technical Center of Light Manipulations & Shandong Provincial Key Laboratory of Optics and Photonic Device, College of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
Nanomaterials (Basel). 2020 Apr 11;10(4):730. doi: 10.3390/nano10040730.
We demonstrate that the interference pattern of the plasmonic and photonic modes can be controlled by changing the slit width of a square slit structure. Based on the analyses of the plasmonic and photonic modes of slits with different widths, we theoretically derived the expressions of wavefield generated by a square slit. A far-field scattered imaging system is utilized to collect the intensity distribution experimentally. Various interference patterns, including stripes, square-like lattice array, and diamond-like lattice array, have been observed by adjusting the slit widths. In addition, the results were validated by performing finite-difference time-domain simulations, which are consistent with the theoretical and experimental results.
我们证明,通过改变方形狭缝结构的狭缝宽度,可以控制等离子体模式和光子模式的干涉图样。基于对不同宽度狭缝的等离子体模式和光子模式的分析,我们从理论上推导了方形狭缝产生的波场表达式。利用远场散射成像系统通过实验收集强度分布。通过调整狭缝宽度,观察到了各种干涉图样,包括条纹、类方形晶格阵列和类菱形晶格阵列。此外,通过进行时域有限差分模拟对结果进行了验证,模拟结果与理论和实验结果一致。