远红外技术（FIT）治疗贴，预防炎症、氧化应激，促进细胞活力。

Far Infrared Technology (FIT) Therapy Patches, Protects from Inflammation, Oxidative Stress and Promotes Cellular Vitality.

机构信息

Department of Systems Medicine, University of Rome Tor Vergata, Rome, Italy.

Department of Human Sciences and Quality of Life Promotion, San Raffaele Roma Open University, Rome, Italy.

出版信息

Curr Pharm Des. 2020;26(34):4323-4329. doi: 10.2174/1381612826666200427112023.

DOI:10.2174/1381612826666200427112023

PMID:32338211

Abstract

BACKGROUND

It is known from the most recent literature that far-infrared (FIR) radiations promote a broad spectrum of therapeutic benefits for cells and tissues.

OBJECTIVE

To identify molecular mechanisms by which FIT patches, as a far infrared technology, protects against damage caused by inflammatory process and oxidative stress.

METHODS

Endothelial cells (HUVEC, Human Umbilical Vein Endothelial Cells) were used as in vitro experimental model. HUVEC were stimulated with a pro-inflammatory cytokine, TNF-α, or hydrogen peroxide (H2O2) to induce oxidative stress. As markers of inflammation were evaluated: VCAM1 (Vascular Cell Adhesion Molecule 1), ICAM1 (Intercellular Adhesion Molecule 1) and E-Selectin by Western Blot analysis. Oxidative stress was assessed by cytofluorimetric analysis. The experiments were performed on control cells (no patch) or in cells treated with the FIT infrared technology applied on the basis of the culture plate.

RESULTS

HUVEC stimulated with TNF-α and treated with FIT patches had significant reduction of the expression of VCAM1, ICAM1 and E-Selectin (p<0.05). HUVEC stimulated with H2O2 and treated with FIT patches were significantly protected from oxidative stress (p <0.01) when compared to control cells. We measured cell viability and proliferation in HUVEC and HEK-293 (Human embryonic kidney cells) cells by MTT assay. HEK-293 and HUVEC treated with FIT patches showed a significantly higher percentage of basal vitality compared to control cells (p<0.0001 for HEK-293, p<0.05 for HUVEC).

CONCLUSION

FIT therapy patches - infrared technology, through these protective mechanisms, could be used in all pathologies where an increase in inflammation, oxidative stress and degenerative state are present.

摘要

背景

最新文献表明，远红外（FIR）辐射可促进细胞和组织产生广泛的治疗益处。

目的

确定 FIT 贴片（一种远红外技术）通过何种分子机制来防止炎症过程和氧化应激引起的损伤。

方法

将人脐静脉内皮细胞（HUVEC）用作体外实验模型。用促炎细胞因子 TNF-α或过氧化氢（H2O2）刺激 HUVEC 以诱导氧化应激。通过 Western Blot 分析评估炎症标志物：VCAM1（血管细胞黏附分子 1）、ICAM1（细胞间黏附分子 1）和 E-选择素。通过细胞荧光分析评估氧化应激。在对照细胞（无贴片）或用 FIT 红外技术处理的细胞（根据培养板进行处理）上进行实验。

结果

用 TNF-α刺激并用 FIT 贴片处理的 HUVEC 表达 VCAM1、ICAM1 和 E-选择素的水平显著降低（p<0.05）。与对照细胞相比，用 H2O2 刺激并用 FIT 贴片处理的 HUVEC 受到氧化应激的显著保护（p <0.01）。我们通过 MTT 测定法测量 HUVEC 和 HEK-293（人胚肾细胞）细胞中的细胞活力和增殖。与对照细胞相比，用 FIT 贴片处理的 HEK-293 和 HUVEC 显示出明显更高的基础活力百分比（p<0.0001 用于 HEK-293，p<0.05 用于 HUVEC）。