Westover Tyler R, Aryal Basu R, Ranasinghe Dulashani R, Uprety Bibek, Harb John N, Woolley Adam T, Davis Robert C
Department of Physics and Astronomy, Brigham Young University, Provo, Utah 84602, United States.
Department of Chemistry and Biochemistry, Brigham Young University, Provo, Utah 84602, United States.
Langmuir. 2020 Jun 23;36(24):6661-6667. doi: 10.1021/acs.langmuir.0c00594. Epub 2020 Jun 10.
DNA origami-templated fabrication enables bottom-up fabrication of nanoscale structures from a variety of functional materials, including metal nanowires. We studied the impact of low-temperature annealing on the morphology and conductance of DNA-templated nanowires. Nanowires were formed by selective seeding of gold nanorods on DNA origami and gold electroless plating of the seeded structures. At low annealing temperatures (160 °C for seeded-only and 180 °C for plated), the wires broke up and separated into multiple, isolated islands. Through the use of polymer-constrained annealing, the island formation in plated wires was suppressed up to annealing temperatures of 210 °C. Four-point electrical measurements showed that the wires remained conductive after a polymer-constrained annealing at 200 °C.
DNA折纸模板制造技术能够从包括金属纳米线在内的多种功能材料自下而上地制造纳米级结构。我们研究了低温退火对DNA模板纳米线的形态和导电性的影响。纳米线是通过在DNA折纸上选择性地播种金纳米棒并对播种结构进行化学镀来形成的。在低退火温度下（仅播种的为160°C，镀覆的为180°C），金属丝会断裂并分离成多个孤立的岛状结构。通过使用聚合物约束退火，在高达210°C的退火温度下，镀覆金属丝中的岛状结构形成受到抑制。四点电学测量表明，在200°C进行聚合物约束退火后，金属丝仍保持导电。
