Laura Diana M, Scott Nathan L, Vanner Elizabeth A, Miller Darlene, Flynn Harry W
Ophthalmic Surg Lasers Imaging Retina. 2020 May 1;51(5):S13-S16. doi: 10.3928/23258160-20200108-02.
To evaluate antibiotic resistance patterns in Staphylococcus epidermis endophthalmitis isolates, identify antibiotic resistance genes, and compare this to their phenotypic resistance.
Retrospective case series of S. epidermidis isolates from January 2012 to December 2017. Phenotypic resistance was determined from minimum inhibitory concentration values. Genotypic resistance was determined from DNA microarray. The relationship between these was analyzed using Cohen's kappa and predictive value.
Seventy-five isolates were included. More than 60% were resistant to methicillin and erythromycin. Approximately 60% possessed the resistance genes for methicillin and erythromycin, and 25% for clindamycin. There was near perfect agreement between genotype and phenotype for erythromycin and methicillin (kappa = 0.88 and 0.89, respectively). Approximately 98% (P < 0.0001) of isolates with erythromycin and methicillin resistance genes and 90% (P = 0.0006) with clindamycin resistance genes were phenotypically resistant to those antibiotics. None were resistant to vancomycin.
The relationship between genotypic and phenotypic antibiotic resistance highlights that resistance may be polygenic, and genes may be silent. [Ophthalmic Surg Lasers Imaging Retina. 2020;51:S13-S16.].
评估表皮葡萄球菌眼内炎分离株的抗生素耐药模式,鉴定抗生素耐药基因,并将其与表型耐药性进行比较。
回顾性病例系列研究,纳入2012年1月至2017年12月的表皮葡萄球菌分离株。根据最低抑菌浓度值确定表型耐药性。通过DNA微阵列确定基因型耐药性。使用科恩kappa系数和预测值分析两者之间的关系。
共纳入75株分离株。超过60%对甲氧西林和红霉素耐药。约60%携带甲氧西林和红霉素耐药基因,25%携带克林霉素耐药基因。红霉素和甲氧西林的基因型与表型之间几乎完全一致(kappa系数分别为0.88和0.89)。携带红霉素和甲氧西林耐药基因的分离株中约98%(P < 0.0001)以及携带克林霉素耐药基因的分离株中约90%(P = 0.0006)对这些抗生素表型耐药。无一株对万古霉素耐药。
基因型与表型抗生素耐药性之间的关系表明,耐药可能是多基因的,且基因可能是沉默的。[《眼科手术、激光与视网膜成像》。2020;51:S13 - S16。]