Seo Jae Min, Kwon Kui-Kam, Song Ki Young, Chu Chong Nam, Ahn Sung-Hoon
Department of Mechanical & Aerospace Engineering, Seoul National University, 1, Kwanak-ro, Kwanak-gu, Seoul 08826, Korea.
School of Mechanical Engineering, Soongsil University, 369, Sangdo-ro, Dongjak-gu, Seoul 06978, Korea.
Materials (Basel). 2020 Jul 3;13(13):2977. doi: 10.3390/ma13132977.
Glass is a well-known non-conductive material that has many useful properties, and considerable research has been conducted into making circuits on glass. Many deposition techniques have been studied, and laser-induced chemical liquid phase deposition (LCLD) is a well-known and cost-effective method for rapid prototyping of copper deposition on glass. However, the deposition results from the LCLD method on the surface of glass, which shows an issue in its detachment from the substrates because of the relatively low adhesion between deposited copper and the nontreated glass surface. This problem undermines the usability of deposited glass in industrial applications. In this study, the laser-induced backside wet etching (LIBWE) method was performed as a preceding process to fabricate microchannels, which were filled with copper by LCLD. Additional durable copper wire was produced as a result of the enhanced adhesion between the glass and the deposited copper. The adhesion was enhanced by a rough surface and metal layer, which are characteristics of LIBWE machining. Furthermore, the proposed method is expected to broaden the use of deposited glass in industrial applications, such as in stacked or covered multilayer structures with built-in copper wires, because the inserted copper can be physically protected by the microstructures.
玻璃是一种众所周知的非导电材料,具有许多有用的特性,并且已经对在玻璃上制作电路进行了大量研究。已经研究了许多沉积技术,激光诱导化学液相沉积(LCLD)是一种用于在玻璃上快速制备铜沉积的众所周知且具有成本效益的方法。然而,LCLD方法在玻璃表面的沉积结果显示出一个问题,即由于沉积的铜与未处理的玻璃表面之间的附着力相对较低,导致其与基板分离。这个问题削弱了沉积玻璃在工业应用中的可用性。在本研究中,激光诱导背面湿法蚀刻(LIBWE)方法作为制造微通道的前置工艺,通过LCLD在微通道中填充铜。由于玻璃与沉积铜之间的附着力增强,额外生产出了耐用的铜线。LIBWE加工的特点是粗糙表面和金属层,这增强了附着力。此外,所提出的方法有望扩大沉积玻璃在工业应用中的使用范围,例如在具有内置铜线的堆叠或覆盖多层结构中,因为插入的铜可以通过微结构得到物理保护。