Nakashima Yuji, Ito Yuri, Okutsu Kenichi, Nakano Motoyoshi, Misaizu Fuminori
Department of Chemistry, Graduate School of Science, Tohoku University, 6-3 Aoba, Aramaki, Aoba-ku, Sendai 980-8578, Japan.
Phys Chem Chem Phys. 2020 Aug 7;22(29):16926-16933. doi: 10.1039/d0cp03132a. Epub 2020 Jul 16.
Photochemistry of molecular complex ions in the atmosphere affects the composition, density, and growth of chemical species. Photodissociation processes of a mass-selected O(HO) complex ion in the visible and ultraviolet regions were studied by ion imaging experiments and theoretical calculations. At 473 nm excitation, O was the predominant photofragment ion produced. In this O channel, the kinetic energy release was comparable to that estimated using a statistical dissociation model, and the anisotropy parameter was determined to be β = 1.0 ± 0.1. On the other hand, the HO photofragment ion was mainly produced at 355 nm excitation. The kinetic energy release for the HO channel was large and nonstatistical, and the anisotropy parameter was β = 1.9 ± 0.2. Theoretically, the 473 and 355 nm excitations were assigned to the B[combining tilde]A''← X[combining tilde]A'' and D[combining tilde]A''← X[combining tilde]A'' transitions, respectively, both of which were characterized by positive charge transfer from O to HO subunits. To further investigate the dissociation mechanisms, potential energy curves (PECs) and surfaces (PESs) for the O(HO) ion were calculated for the ground and excited states. As a result, the HO channel at 355 nm excitation was explained by rapid dissociation on the repulsive PES of the D[combining tilde] state, while rapid electronic relaxation from the B[combining tilde] to X[combining tilde] state followed by dissociation in the ground state was inferred in the O channel at 473 nm excitation.
大气中分子复合离子的光化学会影响化学物种的组成、密度和生长。通过离子成像实验和理论计算研究了质量选择的O(HO)复合离子在可见光和紫外区域的光解离过程。在473nm激发下,O是产生的主要光碎片离子。在这个O通道中,动能释放与使用统计解离模型估计的结果相当,各向异性参数确定为β = 1.0±0.1。另一方面,HO光碎片离子主要在355nm激发下产生。HO通道的动能释放很大且是非统计性的,各向异性参数为β = 1.9±0.2。理论上,473nm和355nm激发分别对应于B[]A''←X[]A''和D[]A''←X[]A''跃迁,两者都以从O到HO亚基的正电荷转移为特征。为了进一步研究解离机制,计算了O(HO)离子基态和激发态的势能曲线(PEC)和表面(PES)。结果表明,355nm激发下的HO通道可以通过D[]态排斥PES上的快速解离来解释,而在473nm激发下的O通道中,推断是从B[]态到X[~]态的快速电子弛豫,然后在基态解离。