Tambussi Eduardo A, Casadesus Jaume, Munné-Bosch Sergi, Araus José Luis
Unitat de Fisiologia Vegetal, Facultat de Biologia, Universitat de Barcelona, Agda. Diagonal 645 (E08028), Barcelona, Spain.Corresponding author; email:
Servei de Camps Experimentals, Facultat de Biologia, Universitat de Barcelona, Agda. Diagonal 645 (E08028), Barcelona, Spain.
Funct Plant Biol. 2002 Jan;29(1):35-44. doi: 10.1071/PP01104.
We analysed the photoprotective response in water-stressed plants of durum wheat (Triticum turgidum L. var. durum cv. Mexa). The plants were grown in a greenhouse for 4 weeks and then exposed to water stress by withholding water for 8 d. Development of water stress was monitored as the decrease in relative water content (RWC) and net CO2 assimilation of the last fully developed leaf. The photoprotective response was evaluated in the same leaves by analysing modulated chlorophyll fluorescence, leaf spectroradiometrical changes, and pigment content. Measurements were performed 3, 6 (moderate stress) and 8 (severe stress) d after water-stress treatment began. The non-photochemical quenching of chlorophyll fluorescence (qN), as well as the contents of zeaxanthin and antheraxanthin increased significantly after 6 d of treatment. However, a further rise in these xanthophylls on day 8 was not associated with any increase in qN. In addition, the β-carotene content rose significantly on day 8, suggesting an increase in antioxidant defences. The photochemical index (PI), derived from spectroradiometrical measurements, showed a strong progressive drop on days 6 and 8, which was paralleled by an increase in the de-epoxidation state of the xanthophyll cycle (DPS), in particular by the zeaxanthin content. At midday, PI was strongly (negatively) correlated with DPS and qN. These results suggest that the PI may be a reliable indicator of photoprotection in the study of plant stress, and in breeding programs.
我们分析了硬粒小麦(Triticum turgidum L. var. durum cv. Mexa)水分胁迫植株的光保护反应。植株在温室中生长4周,然后通过停水8天使其遭受水分胁迫。通过监测最后一片完全展开叶片的相对含水量(RWC)和净二氧化碳同化量的下降来监测水分胁迫的发展。通过分析调制叶绿素荧光、叶片光谱辐射变化和色素含量,在同一叶片中评估光保护反应。在水分胁迫处理开始后的第3天、第6天(中度胁迫)和第8天(重度胁迫)进行测量。处理6天后,叶绿素荧光的非光化学猝灭(qN)以及玉米黄质和花药黄质的含量显著增加。然而,在第8天这些叶黄素的进一步增加与qN的任何增加均无关。此外,β-胡萝卜素含量在第8天显著上升,表明抗氧化防御能力增强。从光谱辐射测量得出的光化学指数(PI)在第6天和第8天呈强烈的逐渐下降趋势,同时叶黄素循环的脱环氧化状态(DPS)增加,特别是玉米黄质含量增加。在中午,PI与DPS和qN呈强烈(负)相关。这些结果表明,在植物胁迫研究和育种计划中,PI可能是光保护的可靠指标。