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通过离轴电子全息术测定在弛豫InGaN赝衬底上生长的InGaN基量子阱中的内压电电势和铟浓度。

Determination of the internal piezoelectric potentials and indium concentration in InGaN based quantum wells grown on relaxed InGaN pseudo-substrates by off-axis electron holography.

作者信息

Cooper D, Boureau V, Even A, Barbier F, Dussaigne A

机构信息

University of Grenoble-Alpes, CEA, LETI, Minatec Campus, F-38054, Grenoble, France.

出版信息

Nanotechnology. 2020 Nov 20;31(47):475705. doi: 10.1088/1361-6528/abad5f.

Abstract

Micro light emitting diodes have been grown by metal organic vapor phase epitaxy on standard GaN and partly relaxed InGaNOS substrates with the purpose of incorporating higher concentrations of indium for identical growth conditions. Green emission has been demonstrated at wavelengths of 500 nm for the GaN template and 525 and 549 nm for the InGaNOS substrates, respectively. The structure, deformation, indium concentration and piezoelectric potentials have been measured with nm-scale spatial resolution in the same specimens by transmission electron microscopy. We show by off-axis electron holography that the piezoelectric potential and information about the indium concentration from the mean inner potential are obtained simultaneously. By separating the components using a model, we show that for higher concentrations of indium in the quantum wells (QWs) grown on InGaNOS substrates, the piezoelectric potentials are reduced. The measurements of the indium concentrations by electron holography have been verified by combining energy dispersive x-ray spectrometry, x-ray diffraction and from the tensile deformation made by precession electron diffraction. A discussion of the limitations of these advanced aberration-corrected transmission electron microscopy techniques when applied to nm-scale QW structures is given.

摘要

通过金属有机气相外延在标准氮化镓(GaN)和部分弛豫的铟镓氮氧化硅(InGaNOS)衬底上生长了微发光二极管,目的是在相同生长条件下掺入更高浓度的铟。对于GaN模板,在500 nm波长处实现了绿色发光,对于InGaNOS衬底,分别在525 nm和549 nm波长处实现了绿色发光。通过透射电子显微镜在相同样品中以纳米级空间分辨率测量了结构、形变、铟浓度和压电势。我们通过离轴电子全息术表明,同时获得了压电势和来自平均内势的铟浓度信息。通过使用模型分离各分量,我们表明,对于在InGaNOS衬底上生长的量子阱(QW)中更高浓度的铟,压电势会降低。通过结合能量色散X射线光谱法、X射线衍射以及通过进动电子衍射产生的拉伸形变,验证了通过电子全息术对铟浓度的测量。给出了这些先进的像差校正透射电子显微镜技术应用于纳米级QW结构时的局限性讨论。

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