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分级纳米柱结构表面上的滴状冷凝

Dropwise Condensation on a Hierarchical Nanopillar Structured Surface.

作者信息

Baba Soumei, Sawada Kenichiro, Tanaka Kohsuke, Okamoto Atsushi

机构信息

National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba-shi, Ibaraki 305-8564, Japan.

Japan Aerospace Exploration Agency (JAXA), 3-1-1 Yoshinodai, Chuo-ku, Sagamihara, Kanagawa 252-5210, Japan.

出版信息

Langmuir. 2020 Sep 1;36(34):10033-10042. doi: 10.1021/acs.langmuir.0c00950. Epub 2020 Aug 17.

Abstract

Nanopillar structure processing has been performed on condensation surfaces to control wettability and achieve a high heat transfer coefficient via dropwise condensation and jumping droplets. Modified dry etching was performed using gold (Au) nanoparticles generated by annealing Au as a mask. High-aspect-ratio nanopillar processing was also performed to produce uniform pillar surfaces and novel hierarchical pillar surfaces. A uniform nanopillar surface with pillars having diameters of 20-850 nm and a hierarchical pillar surface with thick pillars having diameters ranging from 100 to 860 nm and thin pillars with diameters ranging from 20 to 40 nm were mixed and fabricated. Condensation experiments were performed using the noncoated nanopillar surfaces, and the condensation behaviors on the silicon (Si) surfaces were observed from above using a microscope and from the side using a high-speed camera. On the uniform surface US-3 and the hierarchical surfaces HS-1 and HS-2, droplet jumps were observed frequently in the droplet size range of 20-50 μm. In contrast, as the droplet size increased to 50 μm or more, the number of jumps observed decreased as the droplet size increased. The frequency of droplet jumps on the hierarchical surfaces from the start of condensation to approximately 2 min was higher than that on the uniform surfaces, although the density of droplet formation on the hierarchical surfaces was not relatively large. On the basis of the observation of droplet behavior from the side surface, we identified that the primary jump was due to the coalescence of droplets adhering to the surface and that the subsequent jump was caused by the droplet coalescence when the jump droplets were reattached. The primary jump occurrence rate was high on all pillar surfaces.

摘要

已在冷凝表面上进行了纳米柱结构处理,以控制润湿性,并通过滴状冷凝和跳跃液滴实现高传热系数。使用通过对金(Au)进行退火生成的金纳米颗粒作为掩膜进行改性干法蚀刻。还进行了高纵横比纳米柱处理,以产生均匀的柱表面和新型分层柱表面。将直径为20 - 850nm的柱的均匀纳米柱表面与直径为100至860nm的粗柱和直径为20至40nm的细柱的分层柱表面混合并制造。使用未涂覆的纳米柱表面进行冷凝实验,并使用显微镜从上方和使用高速相机从侧面观察硅(Si)表面上的冷凝行为。在均匀表面US - 3以及分层表面HS - 1和HS - 2上,在20 - 50μm的液滴尺寸范围内频繁观察到液滴跳跃。相比之下,当液滴尺寸增加到50μm或更大时,观察到的跳跃次数随着液滴尺寸的增加而减少。从冷凝开始到大约2分钟,分层表面上的液滴跳跃频率高于均匀表面,尽管分层表面上的液滴形成密度相对不大。基于从侧面观察液滴行为,我们确定主要跳跃是由于附着在表面的液滴聚结,随后的跳跃是由跳跃液滴重新附着时的液滴聚结引起的。在所有柱表面上主要跳跃发生率都很高。

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