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Nd-TUD-1 的合成、表征及光致发光性能。

Synthesis, characterization, and photoluminescence property of Nd-TUD-1.

机构信息

Catalysis Research Group (CRG), Department of Chemistry, College of Science, King Khalid University, P.O. Box 9004, Abha, Saudi Arabia.

Advanced Functional Materials and Optoelectronics Laboratory (AFMOL), Department of Physics, College of Science, King Khalid University, Abha, Saudi Arabia.

出版信息

Luminescence. 2021 Feb;36(1):192-199. doi: 10.1002/bio.3934. Epub 2020 Aug 27.

DOI:10.1002/bio.3934
PMID:32803842
Abstract

Here, five different samples of neodymium (Nd) incorporated 3D-mesoporous siliceous materials were fabricated using a single-step hydrothermal technique. Typically, all samples were subjected to several qualitative elemental and quantitative analyses such as X-ray diffraction, N -adsorption/desorption, scanning electron microscopy, energy dispersive X-ray, mapping, high resolution transmission electron microscopy, diffuse reflectance ultraviolet-visible, and Raman spectroscopy. The characterization results showed that at small loading of Nd (i.e. Si/Nd < 20), only isolated centres of trivalent neodymium ions were tetrahedrally coordinated in the TUD-1 matrix. However, with increasing neodymium loading, additional nanoparticles of neodymium oxide with size 10-20 nm were embedded into silica host pores. Detailed photoluminescence (PL) analysis of all samples was carried out by recording the emission profiles at two diverse excitation wavelengths, 333 and 343 nm, to understand the effect of the Nd environment on the PL emission spectra with special attention to the area between 400 and 600 nm. Most importantly, different peaks of the emission spectrum of each sample exhibited a distinct shape based on the Nd environment. This performance was superior evidence that PL can be applied as a simple and efficient characterization tool to understand the nature of Nd ion linkage with a silica matrix.

摘要

在这里,使用一步水热技术制备了五种不同的掺入钕(Nd)的 3D 介孔硅材料样品。通常,所有样品都经过了几种定性元素和定量分析,例如 X 射线衍射、N 吸附/解吸、扫描电子显微镜、能量色散 X 射线、映射、高分辨率透射电子显微镜、漫反射紫外-可见和拉曼光谱。表征结果表明,在 Nd 的小负载(即 Si/Nd < 20)下,三价钕离子的孤立中心仅在 TUD-1 基质中呈四面体配位。然而,随着钕负载的增加,尺寸为 10-20nm 的氧化钕纳米粒子会嵌入到二氧化硅主体孔中。通过在两个不同的激发波长 333nm 和 343nm 下记录发射谱,对所有样品进行了详细的光致发光(PL)分析,以了解 Nd 环境对 PL 发射光谱的影响,特别关注 400nm 和 600nm 之间的区域。最重要的是,每个样品的发射光谱的不同峰根据 Nd 环境呈现出独特的形状。这种性能是 PL 可以作为一种简单有效的表征工具来理解 Nd 离子与二氧化硅基质结合的性质的有力证据。

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