Jung Jaedong, Park Honghwi, Won Heungsup, Choi Muhan, Lee Chang-Ju, Park Hongsik
School of Electronics Engineering, Kyungpook National University, Daegu 41566, Korea.
Sensors (Basel). 2020 Aug 19;20(17):4661. doi: 10.3390/s20174661.
Graphene-metal contact is crucial to fabricate high-performance graphene photodetectors since the external quantum efficiency (EQE) of the photodetector depends on the contact properties, and the influence of the contact properties is particularly dominant in short channel devices for high-speed applications. Moreover, junction properties between the channel graphene and graphene near the contact are also important to analyze the photoresponse because the built-in electric field in the junction determines the EQE of the photodetector. In this study, we investigated a relation between the photoresponse and the built-in electric field induced from the doping level difference in the junction between the channel graphene and graphene near the contact. The photoresponse could be enhanced with a high junction barrier height that is tuned by the doping level difference. In addition, we observed that the improved electrical characteristics of channel graphene do not guarantee the enhancement of the photoresponse characteristics of graphene photodetectors.
石墨烯与金属的接触对于制造高性能石墨烯光电探测器至关重要,因为光电探测器的外量子效率(EQE)取决于接触特性,并且在用于高速应用的短沟道器件中,接触特性的影响尤为显著。此外,沟道石墨烯与接触附近石墨烯之间的结特性对于分析光响应也很重要,因为结中的内建电场决定了光电探测器的EQE。在本研究中,我们研究了光响应与由沟道石墨烯和接触附近石墨烯之间的结中的掺杂水平差异引起的内建电场之间的关系。通过由掺杂水平差异调节的高结势垒高度可以增强光响应。此外,我们观察到沟道石墨烯电学特性的改善并不能保证石墨烯光电探测器光响应特性的增强。