Moran Isaac W, Cheng Dalton F, Jhaveri Sarav B, Carter Kenneth R
Polymer Science and Engineering Department, University of Massachusetts Amherst, Conte Center for Polymer Research, 120 Governors Drive, Amherst, Massachusetts 01003, USA.
Soft Matter. 2007 Dec 11;4(1):168-176. doi: 10.1039/b711506g.
Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resist. The imprinting was enabled by overcoming resist absorption by polydimethylsiloxane (PDMS) through surface treatment with a layer of (heptadecafluoro-1,1,2,2-tetrahydrodecyl)dimethylchlorosilane. Characterization of the composite molds was done by X-ray photoelectron spectroscopy, nanoindentation, and contact angle measurements. PDMS molds treated with fluoroalkylsilane layer were used to imprint into thin films (70-630 nm) of UV curable resins consisting of either polyurethanes or acrylates, replicating with high fidelity features over the surface of wafer substrates. The use of these highly conformal PDMS molds allowed the patterning of functional materials including gold and aluminium by a simple imprint lithographic technique. This is the first report of the use of modified PDMS surfaces in an imprint process that enables the transfer of sub-micron patterns to underlying layers for device structure fabrication. The patterned features were studied with atomic force microscopy, scanning electron microscopy, and optical microscopy.
在光致抗蚀剂薄膜中实现了亚微米尺寸的软紫外压印光刻。通过用一层（十七氟-1,1,2,2-四氢癸基）二甲基氯硅烷进行表面处理，克服聚二甲基硅氧烷（PDMS）对抗蚀剂的吸收，从而实现压印。通过X射线光电子能谱、纳米压痕和接触角测量对复合模具进行了表征。用氟代烷基硅烷层处理过的PDMS模具被用于压印由聚氨酯或丙烯酸酯组成的可紫外固化树脂薄膜（70 - 630纳米），在晶圆基板表面以高保真度复制特征。使用这些高度保形的PDMS模具，通过简单的压印光刻技术可以对包括金和铝在内的功能材料进行图案化。这是首次报道在压印工艺中使用改性PDMS表面，能够将亚微米图案转移到下层以制造器件结构。通过原子力显微镜、扫描电子显微镜和光学显微镜对图案化特征进行了研究。
