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在基因组复杂性中形成和识别紫外线诱导的 DNA 损伤。

Formation and Recognition of UV-Induced DNA Damage within Genome Complexity.

机构信息

Institut de Biologie Moléculaire des Plantes du CNRS, 12 rue du Général Zimmer, 67000 Strasbourg, France.

出版信息

Int J Mol Sci. 2020 Sep 12;21(18):6689. doi: 10.3390/ijms21186689.

Abstract

Ultraviolet (UV) light is a natural genotoxic agent leading to the formation of photolesions endangering the genomic integrity and thereby the survival of living organisms. To prevent the mutagenetic effect of UV, several specific DNA repair mechanisms are mobilized to accurately maintain genome integrity at photodamaged sites within the complexity of genome structures. However, a fundamental gap remains to be filled in the identification and characterization of factors at the nexus of UV-induced DNA damage, DNA repair, and epigenetics. This review brings together the impact of the epigenomic context on the susceptibility of genomic regions to form photodamage and focuses on the mechanisms of photolesions recognition through the different DNA repair pathways.

摘要

紫外线(UV)是一种天然的遗传毒性物质,会导致光损伤的形成,从而危及基因组的完整性和生物的生存。为了防止紫外线的诱变作用,几种特定的 DNA 修复机制被动员起来,以在基因组结构的复杂性内在光损伤部位准确地维持基因组的完整性。然而,在鉴定和描述 UV 诱导的 DNA 损伤、DNA 修复和表观遗传学之间的因素联系方面,仍然存在一个基本的差距。这篇综述汇集了表观基因组背景对基因组区域易形成光损伤的影响,并重点介绍了通过不同的 DNA 修复途径识别光损伤的机制。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd00/7555853/2969754e2dac/ijms-21-06689-g001.jpg

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