Pfizer Ireland Pharmaceuticals, Ringaskiddy, Co Cork, Ireland.
Analyst. 2020 Nov 9;145(22):7429-7436. doi: 10.1039/d0an01219j.
Within the pharmaceutical industry, it is a regulatory requirement to ensure that pharmaceutical drug manufacturing equipment is clean prior to use. Cleaning processes of manufacturing equipment are performed using a "validated" process and subsequently verified since inadequate cleaning can result in a contaminated or adulterated product. Historically, cleanliness of equipment within Drug Substance/Product/Active Pharmaceutical Ingredient (API) manufacturing is validated and verified using direct swabbing of the equipment and subsequent analytical testing of the swab extract. In this study, a novel approach has been evaluated using a number of innovative technologies and techniques to develop and validate a methodology based on an in situ hand-held Process Analytical Technology (PAT) to verify manufacturing equipment cleanliness and eliminate swabbing and associated off-line laboratory testing. Specular reflectance Mid Infrared (Mid-IR) spectroscopy was used to detect and quantify surface residue. It is expected that this analytical technique will allow the elimination or reduction of the number of swabs and subsequent off-line analytical testing required during cleaning verification of manufacturing equipment in the pharmaceutical and biopharmaceutical industry. This study was focused on the development and validation of a Mid-IR based calibration model. The results indicate that surface a residue of 0.19 μg cm-2 for a specific molecule is detectable using a specular reflectance Mid-IR technique.
在制药行业,确保制药设备在使用前清洁是法规要求。使用“经过验证”的工艺对制造设备进行清洁,随后进行验证,因为清洁不充分可能导致产品受到污染或掺假。从历史上看,药物物质/产品/活性药物成分 (API) 制造设备的清洁度是通过对设备进行直接擦拭和随后对擦拭物提取物进行分析测试来验证和验证的。在这项研究中,评估了一种新方法,该方法使用了许多创新技术和技术,开发和验证了一种基于原位手持过程分析技术 (PAT) 的方法,以验证制造设备的清洁度并消除擦拭和相关的离线实验室测试。镜面反射中红外 (Mid-IR) 光谱用于检测和量化表面残留物。预计这种分析技术将允许在制药和生物制药行业的制造设备清洁验证过程中减少或减少所需的擦拭次数和随后的离线分析测试。本研究专注于基于 Mid-IR 的校准模型的开发和验证。结果表明,使用镜面反射 Mid-IR 技术可以检测到特定分子的 0.19 μg cm-2 表面残留。