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单层极限下二硒化钼的太赫兹表面发射

Terahertz Surface Emission from MoSe at the Monolayer Limit.

作者信息

Fan Zeyu, Xu Manzhang, Huang Yuanyuan, Lei Zhen, Zheng Lu, Zhang Zhiyong, Zhao Wu, Zhou Yixuan, Wang Xuewen, Xu Xinlong, Liu Zheng

机构信息

Shaanxi Joint Lab of Graphene, Institute of Photonics & Photon-Technology, School of Physics, Northwest University, Xi'an 710069, China.

School of Information Science and Technology, Northwest University, Xi'an 710127, China.

出版信息

ACS Appl Mater Interfaces. 2020 Oct 21;12(42):48161-48169. doi: 10.1021/acsami.0c13474. Epub 2020 Oct 12.

Abstract

The surface-charge region of bulk and monolayer MoSe is analyzed directly by terahertz (THz) surface emission spectroscopy in a nondestructive way. Both surface nonlinear optical polarization and surface field-induced photocurrent contribute to the THz radiation in both bulk and monolayer MoSe. The first THz emission mechanism is due to the surface optical rectification and the second one is due to the photogenerated carriers accelerated by the surface depletion field. The THz radiation contribution from the surface optical rectification is basically the same for both bulk and monolayer MoSe because of the same symmetry at the surface. However, the contribution from the surface field-induced photocurrent is ∼94.2% in bulk MoSe and it goes down to 74.5% in monolayer MoSe. This is due to the larger surface depletion field in bulk MoSe (∼2.54 × 10 V/m) compared with that in monolayer MoSe (∼5.42 × 10 V/m), as such THz emission from the bulk is approximately four times larger than that from monolayer MoSe. This work not only proves the clear THz radiation mechanism from MoSe crystals but also affords a THz technology for the surface characterization of two-dimensional materials.

摘要

通过太赫兹(THz)表面发射光谱以非破坏性方式直接分析了体相和单层MoSe的表面电荷区域。表面非线性光学极化和表面场诱导光电流都对体相和单层MoSe中的太赫兹辐射有贡献。第一种太赫兹发射机制是由于表面光学整流,第二种是由于光生载流子被表面耗尽场加速。由于表面具有相同的对称性,表面光学整流对太赫兹辐射的贡献在体相和单层MoSe中基本相同。然而,表面场诱导光电流的贡献在体相MoSe中约为94.2%,在单层MoSe中降至74.5%。这是因为体相MoSe中的表面耗尽场(约2.54×10 V/m)比单层MoSe中的(约5.42×10 V/m)更大,因此体相的太赫兹发射大约是单层MoSe的四倍。这项工作不仅证明了MoSe晶体清晰的太赫兹辐射机制,还为二维材料的表面表征提供了一种太赫兹技术。

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