Department of Materials Science and Engineering, Korea University, Seoul, 02841, South Korea.
Nanoscience Center for Optoelectronic and Energy Devices [Nano-COED], Department of Chemistry, Sona College of Technology, Salem, Tamilnadu, 636005, India.
Environ Sci Pollut Res Int. 2021 Feb;28(6):6459-6469. doi: 10.1007/s11356-020-10910-0. Epub 2020 Sep 30.
A simple oxidation method for preparing CuO nanodisks on a flexible Cu sheet is presented. The crystal structure of as-prepared CuO nanodisks was analyzed by X-ray diffraction. The elemental composition and surface morphology were documented by X-ray photoelectron spectroscopy, scanning, and transmission electron microscopy. The photocatalytic performance of flexible Cu/CuO nanodisks was tested to mediate the degradation of RhB and MB dyes. After 2nd recycling, an in situ transformation of the nanodisk surface leads to electron transfer between the conduction bands of CuO and CuO phase, accelerating the degradation of the dyes due to a more favorable electron-hole separation under different band gap engineering. The optical and electrochemical impedance analyses were conducted to examine the efficiency of photogenerated charge carrier separation. Additionally, in the photodegradation system of Cu/CuO nanodisks, the generation of superoxide radical (·O) is responsible for the dye degradation under daylight irradiation. The generation of the latter radical is energetically feasible since the conduction band of CuO (- 0.28 eV) is well-matching with the redox potential of O/·O (- 0.28 eV). Consequently, it is concluded that the cyclic stability shows the usefulness of Cu/CuO nanodisk preparation for the dye degradation under daylight irradiation. Graphical abstract.
一种在柔性铜片上制备氧化铜纳米盘的简单氧化方法。通过 X 射线衍射分析了所制备的 CuO 纳米盘的晶体结构。通过 X 射线光电子能谱、扫描和透射电子显微镜记录了元素组成和表面形态。测试了柔性 Cu/CuO 纳米盘的光催化性能,以介导 RhB 和 MB 染料的降解。经过 2 次循环后,纳米盘表面的原位转化导致 CuO 和 CuO 相的导带之间发生电子转移,由于不同能带工程下更有利的电子-空穴分离,加速了染料的降解。进行了光学和电化学阻抗分析,以检查光生载流子分离的效率。此外,在 Cu/CuO 纳米盘的光降解体系中,在日光照射下,超氧自由基(·O)的生成负责染料的降解。由于 CuO 的导带(-0.28 eV)与 O/·O 的氧化还原电位(-0.28 eV)相匹配,因此后者自由基的生成在能量上是可行的。因此,可以得出结论,循环稳定性表明在日光照射下使用 Cu/CuO 纳米盘制备用于染料降解的有用性。