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室温压缩下氮化镓柱体尺寸依赖的断裂行为

Size-dependent fracture behavior of GaN pillars under room temperature compression.

作者信息

Fan Sufeng, Li Xiaocui, Fan Rong, Lu Yang

机构信息

Department of Mechanical Engineering, City University of Hong Kong, Kowloon, Hong Kong.

出版信息

Nanoscale. 2020 Nov 26;12(45):23241-23247. doi: 10.1039/d0nr05400c.

DOI:10.1039/d0nr05400c
PMID:33206089
Abstract

Gallium nitride (GaN) offers high electron mobility, breakdown voltage and saturation velocity, and is an ideal candidate for advanced electronic and power devices. Meanwhile, it can also be used for microelectromechanical systems (MEMS) and micro/nano-mechanical devices. These applications fundamentally rely on its mechanical properties and structural reliability, in particular at the micro/nanoscale. In this paper, single crystalline [0001]-oriented GaN pillars with diameters ranging from ∼200 nm to ∼1.5 μm were microfabricated and systematically characterized by in situ compression tests inside a SEM/TEM at room temperature. It showed that a crack would nucleate at the top of the pillars with diameters >800 nm and propagate axially during compression. However, pillars with diameters less than 700 nm would deform plastically without splitting, with maximum stress up to 10 GPa. The corresponding yield/fracture strengths show a strong size effect, which increases from ∼4 GPa to ∼11 GPa with the diameter decreasing from ∼1.5 μm to ∼400 nm. In situ TEM compression tests suggest that the formation of slip bands on the (01[combining macron]11) plane dominates the plastic deformation of the pillars with diameters of ∼200-700 nm, while both crack splitting and slip bands were observed in the pillars with diameters around 700 to 800 nm during the brittle-to-ductile transition. This work provides critical insights for developing robust GaN-based MEMS and power electronic applications.

摘要

氮化镓(GaN)具有高电子迁移率、击穿电压和饱和速度,是先进电子和功率器件的理想候选材料。同时,它还可用于微机电系统(MEMS)和微/纳米机械装置。这些应用从根本上依赖于其机械性能和结构可靠性,尤其是在微/纳米尺度上。在本文中,通过室温下在扫描电子显微镜/透射电子显微镜(SEM/TEM)内进行原位压缩测试,对直径范围从约200纳米至约1.5微米的单晶[0001]取向氮化镓柱进行了微加工和系统表征。结果表明,直径大于800纳米的柱体在顶部会产生裂纹,并在压缩过程中轴向扩展。然而,直径小于700纳米的柱体会发生塑性变形而不破裂,最大应力可达10吉帕。相应的屈服/断裂强度呈现出强烈的尺寸效应,随着直径从约1.5微米减小到约400纳米,强度从约4吉帕增加到约11吉帕。原位透射电子显微镜压缩测试表明,(01[combining macron]11)面上滑移带的形成主导了直径约200 - 700纳米柱体的塑性变形,而在直径约700至800纳米的柱体从脆性到延性转变过程中,观察到了裂纹扩展和滑移带现象。这项工作为开发稳健的基于氮化镓的微机电系统和功率电子应用提供了关键见解。

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