Pillatsch Lex, Kalácska Szilvia, Maeder Xavier, Michler Johann
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory of Mechanics of Materials and Nanostructures, Thun CH-3602, Switzerland.
TOFWERK AG., Thun CH-3600, Switzerland.
Microsc Microanal. 2021 Feb;27(1):65-73. doi: 10.1017/S1431927620024678.
Atomic force microscopy (AFM) is a well-known tool for studying surface roughness and to collect depth information about features on the top atomic layers of samples. By combining secondary ion mass spectroscopy (SIMS) with focused ion beam (FIB) milling in a scanning electron microscope (SEM), chemical information of sputtered structures can be visualized and located with high lateral and depth resolution. In this paper, a high vacuum (HV) compatible AFM was installed in a TESCAN FIB-SEM instrument that was equipped with a time-of-flight SIMS (ToF-SIMS) detector. To calibrate the sputtering rate and measure the induced roughness caused by the ToF-SIMS analysis, subsequent AFM measurements were performed on an inorganic multilayer vertical cavity surface-emitting laser sample. Normalized sputtering rates were used to aid the accurate three-dimensional reconstruction of the sputtered volume's chemical composition. Achievable resolution, surface roughness during sputtering, and surface oxidation issues were analyzed. The integration of complementary detectors opens up the ability to determine the sample properties as well as to understand the influence of the Ga+ ion sputtering method on the sample surface during the analysis.
原子力显微镜（AFM）是一种用于研究表面粗糙度并收集有关样品顶部原子层特征深度信息的知名工具。通过在扫描电子显微镜（SEM）中将二次离子质谱（SIMS）与聚焦离子束（FIB）铣削相结合，可以以高横向和深度分辨率可视化并定位溅射结构的化学信息。在本文中，一台高真空（HV）兼容的AFM被安装在一台配备了飞行时间二次离子质谱（ToF-SIMS）探测器的TESCAN FIB-SEM仪器中。为了校准溅射速率并测量由ToF-SIMS分析引起的诱导粗糙度，随后对一个无机多层垂直腔面发射激光器样品进行了AFM测量。使用归一化溅射速率来辅助对溅射体积的化学成分进行精确的三维重建。分析了可实现的分辨率、溅射过程中的表面粗糙度以及表面氧化问题。互补探测器的集成开启了确定样品特性以及理解分析过程中Ga+离子溅射方法对样品表面影响的能力。
