Wang Shiyu, Shen Wenjian, Liu Jiale, Ouyang Tao, Wu Yue, Li Wenhui, Chen Mingyue, Qi Pengcheng, Lu Yu, Tang Yiwen
Department Nano-Science and Technology, College of Physics and Technology, Central China Normal University (CCNU), Wuhan 430079, People's Republic of China.
Michael Grätzel Center for Mesoscopic Solar Cells (MGC), Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST), Wuhan 430074, People's Republic of China.
Nanotechnology. 2021 Apr 2;32(14):145403. doi: 10.1088/1361-6528/abd207.
The state-of-the-art perovskite solar cells (PSCs) with SnO electron transporting material (ETL) layer displays the probability of conquering the low electron mobility and serious leakage current loss of the TiO ETL layer in photoelectronic devices. The rapid development of SnO ETL layer has brought perovskite efficiencies >20%. However, high density of defect states and voltage loss of high temperature SnO are still latent impediment for the long-term stability and hysteresis effect of photovoltaics. Herein, Nb doped SnO with deeper energy level is utilized as a compact ETL for printable mesoscopic PSCs. It promotes carrier concentration increase caused by n-type doping, assists Fermi energy level and conduction band minimum to move the deeper energy level, and significantly reduces interface carrier recombination, thus increasing the photovoltage of the device. As a result, the use of Nb doped SnO brings high photovoltage of 0.92 V, which is 40 mV higher than that of 0.88 V for device based on SnO compact layer. The resulting PSCs displays outstanding efficiency of 13.53%, which contains an ∼10% improvements compared to those without Nb doping. Our study emphasizes the significance of element doping for compact layer and lays the groundwork for high efficiency PSCs.
具有SnO电子传输材料(ETL)层的先进钙钛矿太阳能电池(PSC)显示出克服光电器件中TiO ETL层电子迁移率低和严重漏电流损失问题的可能性。SnO ETL层的快速发展使钙钛矿太阳能电池效率超过了20%。然而,高温SnO的高密度缺陷态和电压损失仍然是光伏器件长期稳定性和滞后效应的潜在障碍。在此,具有更深能级的Nb掺杂SnO被用作可印刷介观PSC的致密ETL。它促进了由n型掺杂引起的载流子浓度增加,有助于费米能级和导带最小值向更深能级移动,并显著减少界面载流子复合,从而提高了器件的光电压。结果,使用Nb掺杂SnO带来了0.92 V的高光电压,比基于SnO致密层的器件的0.88 V高出40 mV。由此得到的PSC显示出13.53%的出色效率,与未掺杂Nb的PSC相比提高了约10%。我们的研究强调了元素掺杂对致密层的重要性,并为高效PSC奠定了基础。