Li Ruiping, Wang Rong, Yuan Ye, Ding Jianxu, Cheng Yingchun, Zhang Zengming, Huang Wei
Key Laboratory of Flexible Electronics & Institute of Advanced Materials, Jiangsu National Synergetic Innovation Center for Advanced Materials, Nanjing Tech University, 30 South Puzhu Road, Nanjing 211816, China.
College of Materials Science and Engineering, Shandong University of Science and Technology, Qingdao 266590, China.
J Phys Chem Lett. 2021 Jan 14;12(1):317-323. doi: 10.1021/acs.jpclett.0c03432. Epub 2020 Dec 22.
Lead-free metal halide perovskites CsCuX (X = Cl, Br, I) with a high photoluminescence quantum yield are promising materials for optoelectronic devices. However, the origin of photoluminescence (PL) emission is still under debate, and the anomalous dependence of PL on pressure is unclear. Here, we systemically study the effects of high pressure on the structural, electronic, and optical properties of CsCuI using a diamond anvil cell (DAC) and first-principles calculations. We argue that the ground state structure of CsCuI belongs to the phase rather than the phase under ambient conditions. There is a structural phase transition from the to the phase for CsCuI at ∼5 GPa. The optical band gap derivative from absorption spectra increases from 3.57 to 3.62 eV within a pressure range of 0 to 4.03 GPa, and it then decreases over 4.03 GPa. There are two major PL emissions peaks at 2.11 and 2.32 eV, which are attributed to the intrinsic defect related trap states in CsCuI. Interestingly, there is an anomalous dependence of both PL emissions on pressure, such that PL peaks show a blueshift and the PL intensity is enhanced from 0 to ∼4 GPa, with redshifting and decreasing at pressures above ∼4 GPa. The anomalous evolution of the two PL emissions also suggests a defect origin of emissions.
具有高光致发光量子产率的无铅金属卤化物钙钛矿CsCuX(X = Cl、Br、I)是光电器件的有前景的材料。然而,光致发光(PL)发射的起源仍在争论中,并且PL对压力的反常依赖性尚不清楚。在此,我们使用金刚石对顶砧(DAC)和第一性原理计算系统地研究了高压对CsCuI的结构、电子和光学性质的影响。我们认为,在环境条件下CsCuI的基态结构属于 相而非 相。CsCuI在约5 GPa时存在从 相到 相的结构相变。吸收光谱得出的光学带隙在0至4.03 GPa的压力范围内从3.57 eV增加到3.62 eV,然后在超过4.03 GPa时减小。在2.11和2.32 eV处有两个主要的PL发射峰,这归因于CsCuI中与本征缺陷相关的陷阱态。有趣的是,两个PL发射对压力均存在反常依赖性,使得PL峰在0至约4 GPa时出现蓝移且PL强度增强,而在高于约4 GPa的压力下出现红移且强度降低。这两个PL发射的反常演化也表明发射源于缺陷。