Cui Entian, Hou Guihua, Chen Xiahui, Xie Minghua, Zhang Feng, Deng Yuxin, Wu Yuqi, Yang Xiuli
Key Laboratory for Advanced Technology in Environmental Protection of Jiangsu Province, Yancheng Institute of Technology, Yancheng 224051, China.
School of Electrical, Computer and Energy Engineering, Arizona State University, Tempe, Arizona 85287, United States.
Langmuir. 2021 Jan 19;37(2):894-907. doi: 10.1021/acs.langmuir.0c03238. Epub 2021 Jan 5.
An interfacial structure is crucial to the photoinduced electron transport for a heterostructure photocatalyst. Constructing an interfacial electron channel with an optimized interfacial structure can efficiently improve the electron-transfer efficiency. Herein, the rapid electron-transfer channels were built up in a CuO/SrFeTaO heterojunction (CuO/SFTO) based on the selective bonding effect of heterologous surface oxygen vacancies in the SFTO component. The heterologous surface oxygen vacancies, namely, V and V, respectively, adjacent to Fe and Ta atoms, were introduced into fabricating the Z-scheme CuO/SFTO heterojunction. Compared with sample CuO/SFTO with V, the photocatalytic NO removal efficiency of sample CuO/SFTO with V and V was increased by 22.5%. The enhanced photocatalytic performance originated from the selective bonding effect of heterologous V and V on the interfacial electron-separating and -transfer efficiency. V is the main body to construct the interfacial electron-transfer channels by forming interfacial Fe-O-Cu(I) bonds, which causes lattice distortion at the interface, and V can optimize the structure of interfacial channels by balancing the electron density of SFTO to control the average space of the interface transition zone. This research provides a new cognitive perspective for constructing double perovskite oxide-based heterostructure photocatalysts.
界面结构对于异质结构光催化剂的光致电子传输至关重要。构建具有优化界面结构的界面电子通道能够有效提高电子转移效率。在此,基于SFTO组分中异质表面氧空位的选择性键合效应,在CuO/SrFeTaO异质结(CuO/SFTO)中建立了快速电子转移通道。在制备Z型CuO/SFTO异质结时引入了分别与Fe和Ta原子相邻的异质表面氧空位,即V和V。与具有V的样品CuO/SFTO相比,具有V和V的样品CuO/SFTO的光催化NO去除效率提高了22.5%。增强的光催化性能源于异质V和V对界面电子分离和转移效率的选择性键合效应。V通过形成界面Fe-O-Cu(I)键成为构建界面电子转移通道的主体,这会导致界面处的晶格畸变,而V可以通过平衡SFTO的电子密度来优化界面通道结构,以控制界面过渡区的平均间距。该研究为构建基于双钙钛矿氧化物的异质结构光催化剂提供了新的认知视角。