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与二氧化钒薄膜界面的二硫化钼单层中相变诱导的温度依赖性声子位移

Phase Transition-Induced Temperature-Dependent Phonon Shifts in Molybdenum Disulfide Monolayers Interfaced with a Vanadium Dioxide Film.

作者信息

Jang A-Rang, Yoon Jongwon, Son Seung-Bae, Ryu Hyeon Ih, Cho Jiung, Shin Ki-Hoon, Sohn Jung Inn, Hong Woong-Ki

机构信息

Department of Electrical Engineering, Semyung University, Jecheon 27136, Republic of Korea.

Jeonju Center, Korea Basic Science Institute, Jeonju, Jeollabukdo 54907, Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2021 Jan 20;13(2):3426-3434. doi: 10.1021/acsami.0c19555. Epub 2021 Jan 7.

Abstract

We report the optical phonon shifts induced by phase transition effects of vanadium dioxide (VO) in monolayer molybdenum disulfide (MoS) when interfacing with a VO film showing a metal-insulator transition coupled with structural phase transition (SPT). To this end, the monolayer MoS directly synthesized on a SiO/Si substrate by chemical vapor deposition was first transferred onto a VO/c-AlO substrate in which the VO film was prepared by a sputtering method. We compared the MoS interfaced with the VO film with the as-synthesized MoS by using Raman spectroscopy. The temperature-dependent Raman scattering characteristics exhibited the distinct phonon behaviors of the E and A modes in the monolayer MoS. Specifically, for the as-synthesized MoS, there were no Raman shifts for each mode, but the enhancement in the Raman intensities of E and A modes was clearly observed with increasing temperature, which could be interpreted by the significant contribution of the interface optical interference effect. In contrast, the red-shifts of both the E and A modes for the MoS transferred onto VO were clearly observed across the phase transition of VO, which could be explained in terms of the in-plane tensile strain effect induced by the SPT and the enhancement of electron-phonon interactions due to an increased electron density at the MoS/VO interface through the electronic phase transition. This study provides further insights into the influence of interfacial hybridization for the heterogeneous integration of 2D transition-metal dichalcogenides and strongly correlated materials.

摘要

我们报道了单层二硫化钼(MoS)与显示金属-绝缘体转变并伴有结构相变(SPT)的二氧化钒(VO)薄膜界面处,VO的相变效应所引起的光学声子频移。为此,首先将通过化学气相沉积法直接在SiO/Si衬底上合成的单层MoS转移到VO/c-AlO衬底上,其中VO薄膜是通过溅射法制备的。我们使用拉曼光谱将与VO薄膜界面处的MoS与合成后的MoS进行了比较。温度依赖的拉曼散射特性展现出单层MoS中E模式和A模式明显不同的声子行为。具体而言,对于合成后的MoS,每个模式均无拉曼频移,但随着温度升高,E模式和A模式的拉曼强度明显增强,这可通过界面光学干涉效应的显著贡献来解释。相比之下,转移到VO上的MoS的E模式和A模式在VO的相变过程中均明显出现红移,这可以用SPT引起的面内拉伸应变效应以及由于电子相变导致MoS/VO界面处电子密度增加而增强的电子-声子相互作用来解释。这项研究为二维过渡金属二硫属化物与强关联材料的异质集成中界面杂化的影响提供了进一步的见解。

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