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气体吸附对铜表面二次电子发射影响的实验研究

Experimental research on influence of gas adsorption on secondary electron emission of copper surface.

作者信息

Zhang Na, Wang Fang, Cao Meng, Cui Wanzhao

机构信息

Key Laboratory for Physical Electronics and Devices of the Ministry of Education, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, PR China; National Key Laboratory of Science and Technology on Space Microwave Laboratory, China Academy of Space Technology (Xi'an), Xi'an, 710100, PR China.

Key Laboratory for Physical Electronics and Devices of the Ministry of Education, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, PR China.

出版信息

Micron. 2021 Mar;142:103009. doi: 10.1016/j.micron.2020.103009. Epub 2021 Jan 4.

Abstract

Secondary electron (SE) emission is a superficial physical phenomenon. The range of SEs excited in materials which are finally emitted from the surface is generally within a few tens of nanometers. SE emission from materials by electron irradiation has great dependence on surface quality, such as gas adsorption, oxidation, contamination, and morphology. In this paper, the influence of surface adsorption of N, O, Ar and air on SE yield (SEY) and the SE spectrum (SES) of copper was investigated by experiment. The measured SEY and SES were compared before and after the copper surface was sputtered by Ar ions. The results show that gas adsorption could increase SEY, and air adsorption lead to the maximum increase, Ar adsorption the minimum. Meanwhile, the relationship between the SES and the SEY was deduced and validated by the experiment. It was also found in the experiment that the Ar ion sputtering or heating alone can effectively reduce the SEY, while heating the sample after Ar ion sputtering increases SEY. The reasons for the variation of the SEYs with gas adsorption, sputtering and heating are preliminarily explained with the help of in-situ XPS. Accordingly, the research helps to further reveal the mechanism of SEE influenced by complex superficial factors.

摘要

二次电子(SE)发射是一种表面物理现象。在材料中被激发并最终从表面发射出来的二次电子的范围通常在几十纳米以内。电子辐照引起的材料二次电子发射很大程度上取决于表面质量,如气体吸附、氧化、污染和形貌。本文通过实验研究了氮、氧、氩和空气的表面吸附对铜的二次电子产额(SEY)和二次电子能谱(SES)的影响。比较了铜表面经氩离子溅射前后测量的SEY和SES。结果表明,气体吸附会增加SEY,空气吸附导致的增加最大,氩吸附导致的增加最小。同时,推导并通过实验验证了SES与SEY之间的关系。实验还发现,单独的氩离子溅射或加热可有效降低SEY,而在氩离子溅射后加热样品则会增加SEY。借助原位X射线光电子能谱(XPS)初步解释了SEY随气体吸附、溅射和加热而变化的原因。因此,该研究有助于进一步揭示受复杂表面因素影响的二次电子发射机制。

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