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采用源内碰撞诱导解离和串联质谱法分析存在等压干扰的化合物的结构。

Structural analysis of a compound despite the presence of an isobaric interference by using in-source Collision Induced Dissociation and tandem mass spectrometry.

机构信息

Univ Brest, UMR UBO-CNRS 6521, Brest, F-29200, France.

出版信息

J Mass Spectrom. 2021 Feb;56(2):e4698. doi: 10.1002/jms.4698.

DOI:10.1002/jms.4698
PMID:33480458
Abstract

The presence of an isobaric contaminant can drastically affect MS and MS/MS patterns leading to erroneous structural and quantitative analysis, which is a real challenge in mass spectrometry. Herein, we demonstrate that MS and MS/MS structural analysis of a compound can be successfully performed despite the presence of an isobaric interference with as low as few millidaltons mass difference by using pseudo-MS . To this end, in-source collisional excitation (in-source CID) and the Survival Yield (SY) technique (energy-resolved collision induced dissociation MS/MS) were performed on two different source geometries: a Z-spray and an orthogonal spray (with a transfer capillary) ionization sources on two different mass spectrometers. By using soft ionization conditions, the SY curve for the mixture is a linear combination of the SY curves from the pure compounds demonstrating the presence of two components in the mixture. In the case of harsher ionization conditions, the SY curve of the mixture perfectly overlaps the SY curve from the pure analyte. This observation demonstrates the isobaric interference has been completely removed by in-source CID fragmentation, independently of the source design, leaving then the analyte precursor ions only. Therefore, by measuring the MS spectrum in harsh ionization conditions and according to SY criterium, the compound of interest can be made free from isobaric interference paving the way for, for example, unequivocal HPLC-MS as well as HPLC-MS/MS structural and quantitative analysis despite the presence of a co-eluting isobaric interference.

摘要

存在等摩尔杂质会极大地影响 MS 和 MS/MS 图谱,导致结构和定量分析错误,这是质谱分析中的一个真正挑战。在此,我们证明,尽管存在低至几个毫道尔顿质量差异的等摩尔干扰,通过使用伪-MS ,仍可以成功进行化合物的 MS 和 MS/MS 结构分析。为此,在两种不同的源几何结构上进行了源内碰撞激发(in-source CID)和生存产率(SY)技术(能量分辨碰撞诱导解离 MS/MS):Z 喷雾和正交喷雾(带有传输毛细管)离子源在两种不同的质谱仪上。通过使用软电离条件,混合物的 SY 曲线是纯化合物的 SY 曲线的线性组合,表明混合物中存在两种成分。在更苛刻的电离条件下,混合物的 SY 曲线与纯分析物的 SY 曲线完美重叠。这一观察结果表明,等摩尔干扰已通过源内 CID 碎裂完全消除,与源设计无关,仅留下分析物前体离子。因此,通过在苛刻的电离条件下测量 MS 光谱,并根据 SY 标准,可以使目标化合物不受等摩尔干扰的影响,为例如,尽管存在共洗脱等摩尔干扰,仍可进行 HPLC-MS 以及 HPLC-MS/MS 结构和定量分析。

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