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通过光芬顿法降低磺胺喹噁啉的氧化和毒性。

Sulfaquinoxaline Oxidation and Toxicity Reduction by Photo-Fenton Process.

机构信息

Chemical Engineering Department, Universitat Politècnica de Catalunya, Escola d'Enginyeria de Barcelona Est (EEBE), Av. Eduard Maristany, 16, 08019 Barcelona, Spain.

School of Civil Engineering, Architecture and Urban Design, FEC, University of Campinas, Unicamp, P.O. Box 6143, Campinas 13083-889, Brazil.

出版信息

Int J Environ Res Public Health. 2021 Jan 23;18(3):1005. doi: 10.3390/ijerph18031005.

DOI:10.3390/ijerph18031005
PMID:33498745
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7908259/
Abstract

Sulfaquinoxaline (SQX) has been detected in environmental water samples, where its side effects are still unknown. To the best of our knowledge, its oxidation by Fenton and photo-Fenton processes has not been previously reported. In this study, SQX oxidation, mineralization, and toxicity ( and bacteria) were evaluated at two different setups: laboratory bench (2 L) and pilot plant (15 L). The experimental design was used to assess the influence of the presence or absence of radiation source, as well as different HO concentrations (94.1 to 261.9 mg L). The experimental conditions of both setups were: SQX = 25 mg L, Fe(II) = 10 mg L, pH 2.8 ± 0.1. Fenton and photo-Fenton were suitable for SQX oxidation and experiments resulted in higher SQX mineralization than reported in the literature. For both setups, the best process was the photo-Fenton (178.0 mg L HO), for which over 90% of SQX was removed, over 50% mineralization, and bacterial growth inhibition less than 13%. In both set-ups, the presence or absence of radiation was equally important for sulfaquinoxaline oxidation; however, the degradation rates at the pilot plant were between two to four times higher than the obtained at the laboratory bench.

摘要

磺胺喹恶啉(SQX)已在环境水样中被检出,但其副作用尚不清楚。据我们所知,其尚未被报道过可以通过芬顿和光芬顿工艺进行氧化。在本研究中,我们在两种不同的设备中评估了 SQX 的氧化、矿化和毒性(对 和 细菌):实验室规模(2 L)和中试规模(15 L)。实验设计用于评估有无辐射源以及不同 HO 浓度(94.1 至 261.9 mg L)的存在对实验的影响。两种设备的实验条件均为:SQX = 25 mg L,Fe(II) = 10 mg L,pH 2.8 ± 0.1。芬顿和光芬顿适用于 SQX 的氧化,实验结果表明 SQX 的矿化程度高于文献报道。对于两种设备,最佳工艺均为光芬顿(178.0 mg L HO),该工艺可去除超过 90%的 SQX,矿化率超过 50%,细菌生长抑制率低于 13%。在两种设备中,有无辐射对磺胺喹恶啉的氧化同样重要;然而,中试设备的降解速率比实验室规模高 2 至 4 倍。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/a7edfc325db4/ijerph-18-01005-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/8a9e5e4da8ce/ijerph-18-01005-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/86cfdaad373c/ijerph-18-01005-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/cc58ebd751be/ijerph-18-01005-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/5fa4613f91f7/ijerph-18-01005-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/59fb8c60d0a5/ijerph-18-01005-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/a7edfc325db4/ijerph-18-01005-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/8a9e5e4da8ce/ijerph-18-01005-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/86cfdaad373c/ijerph-18-01005-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/cc58ebd751be/ijerph-18-01005-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/5fa4613f91f7/ijerph-18-01005-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/59fb8c60d0a5/ijerph-18-01005-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/12d5/7908259/a7edfc325db4/ijerph-18-01005-g006.jpg

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Abatement and toxicity reduction of antimicrobials by UV/HO process.
UV/HO 工艺对抗生素的衰减和毒性降低。
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